Electrochemical behavior of copper in tetramethyl ammonium hydroxide based solutions

W. H. Huang, S. Raghavan, Y. Fang, L. Zhang

Research output: Contribution to journalArticlepeer-review

6 Scopus citations

Abstract

An investigation was undertaken to characterize the electrochemical behavior of copper in tetramethyl ammonium hydroxide (TMAH) based solutions. The effect of hydrogen peroxide and abrasion with a polyvinyl alcohol (PVA) brush on the corrosion of copper in alkaline solutions were characterized. Galvanic interactions between copper and tantalum in TMAH as well as in ammonium hydroxide (NH4OH) solutions were investigated. The experimental results have shown that the corrosion of copper in TMAH is lower than that in NH4OH, especially at pH values higher than 10. Even in the presence of hydrogen peroxide, TMAH corrodes copper at a lower rate than NH4OH.

Original languageEnglish (US)
Pages (from-to)161-166
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
Volume566
StatePublished - Dec 1 1999

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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