Electrochemical investigations of stable cavitation from bubbles generated during reduction of water

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

Megasonic cleaning is traditionally used for removal of particles from wafer surfaces in semiconductor industry. With the advancement of technology node, the major challenge associated with megasonic cleaning is to be able to achieve high cleaning efficiency without causing damage to fragile features. In this paper, a method based on electrochemistry has been developed that allows controlled formation and growth of a hydrogen bubbles close to a solid surface immersed in an aqueous solution irradiated with ∼1 MHz sound field. It has been shown that significant microstreaming from resonating size bubble can be induced by proper choice of transducer duty cycle. This method has the potential to significantly improve the performance of megasonic cleaning technology through generation of local microstreaming, interfacial and pressure gradient forces in close vicinity of conductive surfaces on wafers without affecting the transient cavitation responsible for feature damage.

Original languageEnglish (US)
Pages (from-to)1893-1899
Number of pages7
JournalUltrasonics Sonochemistry
Volume21
Issue number5
DOIs
StatePublished - 2014

Fingerprint

cavitation flow
Bubbles (in fluids)
Cavitation
cleaning
Cleaning
bubbles
Technology
Electrochemistry
Semiconductors
Water
Transducers
water
Hydrogen
Industry
wafers
damage
Pressure
gradients
Acoustic fields
sound fields

Keywords

  • Chronoamperometry
  • Hydrogen bubbles
  • Megasonic cleaning
  • Microstreaming
  • Stable cavitation
  • Water reduction

ASJC Scopus subject areas

  • Chemical Engineering (miscellaneous)
  • Acoustics and Ultrasonics
  • Radiology Nuclear Medicine and imaging

Cite this

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abstract = "Megasonic cleaning is traditionally used for removal of particles from wafer surfaces in semiconductor industry. With the advancement of technology node, the major challenge associated with megasonic cleaning is to be able to achieve high cleaning efficiency without causing damage to fragile features. In this paper, a method based on electrochemistry has been developed that allows controlled formation and growth of a hydrogen bubbles close to a solid surface immersed in an aqueous solution irradiated with ∼1 MHz sound field. It has been shown that significant microstreaming from resonating size bubble can be induced by proper choice of transducer duty cycle. This method has the potential to significantly improve the performance of megasonic cleaning technology through generation of local microstreaming, interfacial and pressure gradient forces in close vicinity of conductive surfaces on wafers without affecting the transient cavitation responsible for feature damage.",
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AU - Raghavan, Srini

AU - Deymier, Pierre A

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AB - Megasonic cleaning is traditionally used for removal of particles from wafer surfaces in semiconductor industry. With the advancement of technology node, the major challenge associated with megasonic cleaning is to be able to achieve high cleaning efficiency without causing damage to fragile features. In this paper, a method based on electrochemistry has been developed that allows controlled formation and growth of a hydrogen bubbles close to a solid surface immersed in an aqueous solution irradiated with ∼1 MHz sound field. It has been shown that significant microstreaming from resonating size bubble can be induced by proper choice of transducer duty cycle. This method has the potential to significantly improve the performance of megasonic cleaning technology through generation of local microstreaming, interfacial and pressure gradient forces in close vicinity of conductive surfaces on wafers without affecting the transient cavitation responsible for feature damage.

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