In this article, electron beam induced changes in the refractive index and film thickness of time relaxed amorphous AsxS100-x (with x = 30-45) and AsxSe100-x (with x = 40-70) are studied. The largest index change (∼0.08) in AsxS100-x films is found when x = 40. The corresponding value (∼0.06) for AsxSe100-x films is met when x = 55. The difference in the best compositions is attributed to the different relaxation processes of As-S and As-Se films. Electron beam irradiation causes surface shrinkage of the films. In AsxSe100-x films contactions are deepest (∼75 nm) when x = 55.
ASJC Scopus subject areas
- Physics and Astronomy(all)