Electron radiation sensitive hybrid sol-gel materials for electron-beam lithography and diffractive optics

J. T. Rantala, R. S. Penner, S. Honkanen, N. Nordman, O. Nordman, J. Vähäkangas, M. Fallahi, N. Peyghambarian

Research output: Contribution to journalConference article

4 Scopus citations

Abstract

We present two techniques to use hybrid sol-gel materials for electron-beam lithography and direct writing of surface relief diffractive elements. We are able to obtain direct physical electron beam etching of hybrid sol-gel glass and variable-doses can induce complex multi-phase-level diffractive elements and apodized sol-gel waveguide gratings. We are also able to obtain hybrid sol-gel glass formation under the electron radiation, so that material can be used as a negative resist in electron-beam lithography. Both of these techniques are promising for the fabrication of submicron optical components and micromachining tools such as embossing masters for the replication.

Original languageEnglish (US)
Pages (from-to)30-37
Number of pages8
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume3469
DOIs
StatePublished - Jul 6 1998
EventOrganic-Inorganic Hybrid Materials for Photonics 1998 - San Diego, United States
Duration: Jul 19 1998Jul 24 1998

Keywords

  • And sol-gel resist
  • Diffractive elements
  • Electron beam writing
  • Hybrid sol-gel
  • Integrated optics

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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