Electrooptic polymer modulator with single-mode to multimode waveguide transitions

Christopher T. DeRose, David Mathine, Yasufumi Enami, Robert A Norwood, Jingdong Luo, Alex K Y Jen, Nasser N Peyghambarian

Research output: Contribution to journalArticle

18 Citations (Scopus)

Abstract

Grayscale lithography has been used to create refractive index (RI) tapers in an electrooptic (EO) polymer modulator. These RI tapers are used to convert a passive single-mode photobleached polymer waveguide to the fundamental mode of an unbleached, active multimode polymer waveguide. The benefits of this modulator design include a coupling loss reduction of 2.6 dB per interface and an increased confinement factor of 0.83. Using this design, an EO polymer modulator was fabricated with a halfwave voltage of 1.9 V, modulation extinction ratio of 15 dB, and a fiber to lens insertion loss of 11.6 dB.

Original languageEnglish (US)
Pages (from-to)1051-1053
Number of pages3
JournalIEEE Photonics Technology Letters
Volume20
Issue number12
DOIs
StatePublished - Jun 15 2008

Fingerprint

Electrooptical effects
Modulators
electro-optics
modulators
Polymers
Waveguides
waveguides
polymers
tapering
Refractive index
refractivity
Insertion losses
insertion loss
Lithography
Lenses
extinction
lithography
lenses
Modulation
modulation

Keywords

  • Electrooptic (EO) polymer
  • Grayscale lithography
  • Modulator
  • Sol-gel

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Atomic and Molecular Physics, and Optics
  • Electronic, Optical and Magnetic Materials

Cite this

Electrooptic polymer modulator with single-mode to multimode waveguide transitions. / DeRose, Christopher T.; Mathine, David; Enami, Yasufumi; Norwood, Robert A; Luo, Jingdong; Jen, Alex K Y; Peyghambarian, Nasser N.

In: IEEE Photonics Technology Letters, Vol. 20, No. 12, 15.06.2008, p. 1051-1053.

Research output: Contribution to journalArticle

DeRose, Christopher T. ; Mathine, David ; Enami, Yasufumi ; Norwood, Robert A ; Luo, Jingdong ; Jen, Alex K Y ; Peyghambarian, Nasser N. / Electrooptic polymer modulator with single-mode to multimode waveguide transitions. In: IEEE Photonics Technology Letters. 2008 ; Vol. 20, No. 12. pp. 1051-1053.
@article{debeeb6063b84a0683e2e7683beca99b,
title = "Electrooptic polymer modulator with single-mode to multimode waveguide transitions",
abstract = "Grayscale lithography has been used to create refractive index (RI) tapers in an electrooptic (EO) polymer modulator. These RI tapers are used to convert a passive single-mode photobleached polymer waveguide to the fundamental mode of an unbleached, active multimode polymer waveguide. The benefits of this modulator design include a coupling loss reduction of 2.6 dB per interface and an increased confinement factor of 0.83. Using this design, an EO polymer modulator was fabricated with a halfwave voltage of 1.9 V, modulation extinction ratio of 15 dB, and a fiber to lens insertion loss of 11.6 dB.",
keywords = "Electrooptic (EO) polymer, Grayscale lithography, Modulator, Sol-gel",
author = "DeRose, {Christopher T.} and David Mathine and Yasufumi Enami and Norwood, {Robert A} and Jingdong Luo and Jen, {Alex K Y} and Peyghambarian, {Nasser N}",
year = "2008",
month = "6",
day = "15",
doi = "10.1109/LPT.2008.924177",
language = "English (US)",
volume = "20",
pages = "1051--1053",
journal = "IEEE Photonics Technology Letters",
issn = "1041-1135",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
number = "12",

}

TY - JOUR

T1 - Electrooptic polymer modulator with single-mode to multimode waveguide transitions

AU - DeRose, Christopher T.

AU - Mathine, David

AU - Enami, Yasufumi

AU - Norwood, Robert A

AU - Luo, Jingdong

AU - Jen, Alex K Y

AU - Peyghambarian, Nasser N

PY - 2008/6/15

Y1 - 2008/6/15

N2 - Grayscale lithography has been used to create refractive index (RI) tapers in an electrooptic (EO) polymer modulator. These RI tapers are used to convert a passive single-mode photobleached polymer waveguide to the fundamental mode of an unbleached, active multimode polymer waveguide. The benefits of this modulator design include a coupling loss reduction of 2.6 dB per interface and an increased confinement factor of 0.83. Using this design, an EO polymer modulator was fabricated with a halfwave voltage of 1.9 V, modulation extinction ratio of 15 dB, and a fiber to lens insertion loss of 11.6 dB.

AB - Grayscale lithography has been used to create refractive index (RI) tapers in an electrooptic (EO) polymer modulator. These RI tapers are used to convert a passive single-mode photobleached polymer waveguide to the fundamental mode of an unbleached, active multimode polymer waveguide. The benefits of this modulator design include a coupling loss reduction of 2.6 dB per interface and an increased confinement factor of 0.83. Using this design, an EO polymer modulator was fabricated with a halfwave voltage of 1.9 V, modulation extinction ratio of 15 dB, and a fiber to lens insertion loss of 11.6 dB.

KW - Electrooptic (EO) polymer

KW - Grayscale lithography

KW - Modulator

KW - Sol-gel

UR - http://www.scopus.com/inward/record.url?scp=58049136569&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=58049136569&partnerID=8YFLogxK

U2 - 10.1109/LPT.2008.924177

DO - 10.1109/LPT.2008.924177

M3 - Article

AN - SCOPUS:58049136569

VL - 20

SP - 1051

EP - 1053

JO - IEEE Photonics Technology Letters

JF - IEEE Photonics Technology Letters

SN - 1041-1135

IS - 12

ER -