Electrothermal vaporization coupled with inductively coupled plasma array-detector mass spectrometry for the multielement analysis of Al 2O3 ceramic powders

Birgit U. Peschel, Francisco Andrade, William C. Wetzel, Gregory D. Schilling, Gary M. Hieftje, José A C Broekaert, Roger Sperline, M Bonner Denton, Charles J. Barinaga, David W. Koppenaal

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An electrothermal vaporization (ETV) system useful for the analysis of solutions and slurries has been coupled with a sector-field inductively coupled plasma mass spectrometer (ICP-MS) equipped with an array detector. The ability of this instrument to record the transient signals produced for a number of analytes in ETV-ICP-MS is demonstrated. Detection limits for Mn, Fe, Co, Ni, Cu, Zn and Ga are in the range of 4-60 pg μL- 1 for aqueous solutions and in the low μg g- 1 range for the analysis of 10 mg mL- 1 slurries of Al2O3 powders. The dynamic ranges measured for Fe, Cu and Ga spanned 3-5 orders of magnitude when the detector was operated in the low-gain mode and appear to be limited by the ETV system. Trace amounts of Fe, Cu and Ga could be directly determined in Al 2O3 powders at the 2-270 μg g- 1 level without the use of thermochemical reagents. The results well agree with literature values for Fe and Cu, whereas deviations of 50% at the 90 μg g- 1 level for Ga were found.

Original languageEnglish (US)
Pages (from-to)42-49
Number of pages8
JournalSpectrochimica Acta Part B: Atomic Spectroscopy
Issue number1
Publication statusPublished - Jan 2006



  • Array detector mass spectrometry
  • Electrothermal vaporization
  • Inductively coupled plasma mass spectrometry

ASJC Scopus subject areas

  • Analytical Chemistry
  • Spectroscopy

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