Enabling high performance instruments for astronomy and space exploration with ALD

F. Greer, M. E. Hoenk, B. C. Jacquot, T. J. Jones, M. R. Dickie, S. P. Monacos, S. Nikzad, E. Hamden, D. Schmonivich, P. Day, H. Leduc

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Future UV, X-ray, and sub-millimeter telescopes and spectrometers have the potential to revolutionize our understanding of the formation and habitability of the modern universe.(1-4) Star formation, dark energy, and the composition of the intergalactic medium are only some of the key scientific topics that can be addressed by UV astronomy and astrophysics. Sub-millimeter astronomy can probe the fine structure of the cosmic microwave background, giving glimpses into the early universe immediately following the Big Bang.(5) Various surface engineering techniques including molecular beam epitaxy and atomic layer deposition have been utilized here to significantly boost the performance of key components of instruments for astronomy and astrophysics investigation, taking advantage of the atomic level precision that these techniques provide.

Original languageEnglish (US)
Title of host publicationAtomic Layer Deposition Applications 7
Pages263-268
Number of pages6
Edition2
DOIs
StatePublished - Dec 1 2011
Externally publishedYes
Event7th Symposium on Atomic Layer Deposition Applications - 220th ECS Meeting - Boston, MA, United States
Duration: Oct 10 2011Oct 12 2011

Publication series

NameECS Transactions
Number2
Volume41
ISSN (Print)1938-5862
ISSN (Electronic)1938-6737

Conference

Conference7th Symposium on Atomic Layer Deposition Applications - 220th ECS Meeting
CountryUnited States
CityBoston, MA
Period10/10/1110/12/11

ASJC Scopus subject areas

  • Engineering(all)

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  • Cite this

    Greer, F., Hoenk, M. E., Jacquot, B. C., Jones, T. J., Dickie, M. R., Monacos, S. P., Nikzad, S., Hamden, E., Schmonivich, D., Day, P., & Leduc, H. (2011). Enabling high performance instruments for astronomy and space exploration with ALD. In Atomic Layer Deposition Applications 7 (2 ed., pp. 263-268). (ECS Transactions; Vol. 41, No. 2). https://doi.org/10.1149/1.3633676