Environmentally friendly natural materials based photoacid generators for next generation photolithography

Youngjin Cho, Christine Y. Ouyang, Marie Krysak, Wenjie Sun, Victor Gamez, Reyes Sierra-Alvarez, Christopher K. Ober

Research output: Chapter in Book/Report/Conference proceedingConference contribution

4 Scopus citations

Abstract

We describe the development of new triphenylsulfonium photoacid generators (TPS PAGs) with semifluorinated sulfonate anions containing glucose or other natural product groups, and their successful application to patterning sub-100 nm features using 254 nm and e-beam lithography. The TPS PAGs with functionalized octafluoro-3-oxapentanesulfonate were synthesized efficiently in high purity and high yield by utilizing simple and unique chemistries on 5-iodooctafluoro-3-oxapentanesulfonyl fluoride. The PAGs has been fully evaluated in terms of chemical properties, lithographic performance, environmental friendliness or toxicological impact. The PAGs are non-toxic and it is susceptible to chemical degradation and to microbial attack under aerobic/anaerobic conditions. These new PAGs are very attractive materials for high resolution photoresist applications and they are particularly useful in addressing the environmental concerns caused by PFOS and other perfluoroalkyl surfactants.

Original languageEnglish (US)
Title of host publicationAdvances in Resist Materials and Processing Technology XXVIII
DOIs
StatePublished - May 17 2011
EventAdvances in Resist Materials and Processing Technology XXVIII - San Jose, CA, United States
Duration: Feb 28 2011Mar 2 2011

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume7972
ISSN (Print)0277-786X

Other

OtherAdvances in Resist Materials and Processing Technology XXVIII
CountryUnited States
CitySan Jose, CA
Period2/28/113/2/11

Keywords

  • 193nm
  • Degradation
  • EUV
  • PFOS
  • Photoacid generator (PAG)
  • Photolithograpy
  • Sweet PAG

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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  • Cite this

    Cho, Y., Ouyang, C. Y., Krysak, M., Sun, W., Gamez, V., Sierra-Alvarez, R., & Ober, C. K. (2011). Environmentally friendly natural materials based photoacid generators for next generation photolithography. In Advances in Resist Materials and Processing Technology XXVIII [79722A] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 7972). https://doi.org/10.1117/12.879816