Er-doped amorphous and crystalline Al2O3 and La2O3 films grown with low energy ions from an ECR plasma

J. C. Barbour, B. G. Potter, D. M. Follstaedt, J. A. Knapp, M. B. Sinclair

Research output: Contribution to journalConference article

Abstract

The effects of low energy ions from a biased electron cyclotron resonance plasma during growth of Al2O3 and La2O3 are used to modify the density and crystalline quality of these oxide films. The type of phase formed for Al2O3 is varied with the ion-assisted growth from amorphous to crystalline γ-Al2O3. The photoluminescence (PL) properties of different Er-doped Al- and La-oxide phases are examined, and through comparison of the PL spectra, the local environment of Er in these oxide materials is discussed.

Original languageEnglish (US)
Pages (from-to)465-470
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
Volume438
StatePublished - Dec 1 1996
EventProceedings of the 1996 MRS Fall Meeting - Boston, MA, USA
Duration: Dec 4 1996Dec 5 1996

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ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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