Error analysis for CGH optical testing

Yu Chun Chang, James Burge

Research output: Contribution to journalConference article

58 Scopus citations

Abstract

Computer generated holograms are widely used in optical testing and metrology. The primary role of the CGHs is to generate reference wavefront with any desired shape. Optical or electron-beam writers are commonly used for CGH fabrication. Limitations from the hologram fabrication processes cause errors in the reproduced wavefront. Errors in duty-cycle and etching depth have direct impact on both the amplitude and phase functions of the reproduced wavefront. A study using scalar diffraction model to simulate CGH fabrication errors and their effects on wavefront amplitude and phase functions are presented. Experimental analysis confirms the theoretical model. An example is given at the end to demonstrate one of the many applications of the wavefront sensitivity functions in CGH error budgeting for optical metrology.

Original languageEnglish (US)
Pages (from-to)358-366
Number of pages9
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume3782
StatePublished - Dec 1 1999
EventProceedings of the 1999 'Optical Manufacturing and Testing III' - Denver, CO, USA
Duration: Jul 20 1999Jul 23 1999

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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