Etching of silicon dioxide with gas phase HF and water: Initiation, bulk etching, and termination

Gerardo Montaño-Miranda, Anthony J Muscat

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)
Original languageEnglish (US)
Title of host publicationSolid State Phenomena
PublisherTrans Tech Publications Ltd
Pages3-6
Number of pages4
Volume134
ISBN (Print)3908451469, 9783908451464
StatePublished - 2008
Event8th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2006 - Antwerp, Belgium
Duration: Sep 18 2006Sep 20 2006

Publication series

NameSolid State Phenomena
Volume134
ISSN (Print)10120394

Other

Other8th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2006
CountryBelgium
CityAntwerp
Period9/18/069/20/06

Fingerprint

Silicon Dioxide
Etching
Gases
Silica
etching
vapor phases
silicon dioxide
Water
water

Keywords

  • Gas phase etching
  • HF
  • Surface characterization
  • Surface preparation
  • Water

ASJC Scopus subject areas

  • Materials Science(all)
  • Physics and Astronomy (miscellaneous)
  • Condensed Matter Physics
  • Electronic, Optical and Magnetic Materials

Cite this

Montaño-Miranda, G., & Muscat, A. J. (2008). Etching of silicon dioxide with gas phase HF and water: Initiation, bulk etching, and termination. In Solid State Phenomena (Vol. 134, pp. 3-6). (Solid State Phenomena; Vol. 134). Trans Tech Publications Ltd.

Etching of silicon dioxide with gas phase HF and water : Initiation, bulk etching, and termination. / Montaño-Miranda, Gerardo; Muscat, Anthony J.

Solid State Phenomena. Vol. 134 Trans Tech Publications Ltd, 2008. p. 3-6 (Solid State Phenomena; Vol. 134).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Montaño-Miranda, G & Muscat, AJ 2008, Etching of silicon dioxide with gas phase HF and water: Initiation, bulk etching, and termination. in Solid State Phenomena. vol. 134, Solid State Phenomena, vol. 134, Trans Tech Publications Ltd, pp. 3-6, 8th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2006, Antwerp, Belgium, 9/18/06.
Montaño-Miranda G, Muscat AJ. Etching of silicon dioxide with gas phase HF and water: Initiation, bulk etching, and termination. In Solid State Phenomena. Vol. 134. Trans Tech Publications Ltd. 2008. p. 3-6. (Solid State Phenomena).
Montaño-Miranda, Gerardo ; Muscat, Anthony J. / Etching of silicon dioxide with gas phase HF and water : Initiation, bulk etching, and termination. Solid State Phenomena. Vol. 134 Trans Tech Publications Ltd, 2008. pp. 3-6 (Solid State Phenomena).
@inproceedings{acde3f2db5524eeeb40b21ba36da080e,
title = "Etching of silicon dioxide with gas phase HF and water: Initiation, bulk etching, and termination",
keywords = "Gas phase etching, HF, Surface characterization, Surface preparation, Water",
author = "Gerardo Monta{\~n}o-Miranda and Muscat, {Anthony J}",
year = "2008",
language = "English (US)",
isbn = "3908451469",
volume = "134",
series = "Solid State Phenomena",
publisher = "Trans Tech Publications Ltd",
pages = "3--6",
booktitle = "Solid State Phenomena",

}

TY - GEN

T1 - Etching of silicon dioxide with gas phase HF and water

T2 - Initiation, bulk etching, and termination

AU - Montaño-Miranda, Gerardo

AU - Muscat, Anthony J

PY - 2008

Y1 - 2008

KW - Gas phase etching

KW - HF

KW - Surface characterization

KW - Surface preparation

KW - Water

UR - http://www.scopus.com/inward/record.url?scp=38549089556&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=38549089556&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:38549089556

SN - 3908451469

SN - 9783908451464

VL - 134

T3 - Solid State Phenomena

SP - 3

EP - 6

BT - Solid State Phenomena

PB - Trans Tech Publications Ltd

ER -