@inproceedings{c1125b5f416a4a8a9e48bb0900b2fcb9,
title = "Etching of silicon dioxide with gas phase HF and water: Initiation, bulk etching, and termination",
keywords = "Gas phase etching, HF, Surface characterization, Surface preparation, Water",
author = "Gerardo Monta{\~n}o-Miranda and Anthony Muscat",
note = "Copyright: Copyright 2020 Elsevier B.V., All rights reserved.; 8th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2006 ; Conference date: 18-09-2006 Through 20-09-2006",
year = "2008",
doi = "10.4028/3-908451-46-9.3",
language = "English (US)",
isbn = "3908451469",
series = "Solid State Phenomena",
publisher = "Trans Tech Publications Ltd",
pages = "3--6",
booktitle = "Ultra Clean Processing of Semiconductor Surfaces VIII - UCPSS 2006 - Selected, peer reviewed papers from the 8th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS)",
}