Etching of silicon dioxide with gas phase HF and water: Initiation, bulk etching, and termination

Gerardo Montaño-Miranda, Anthony Muscat

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Original languageEnglish (US)
Title of host publicationUltra Clean Processing of Semiconductor Surfaces VIII - UCPSS 2006 - Selected, peer reviewed papers from the 8th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS)
PublisherTrans Tech Publications Ltd
Pages3-6
Number of pages4
ISBN (Print)3908451469, 9783908451464
DOIs
StatePublished - 2008
Event8th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2006 - Antwerp, Belgium
Duration: Sep 18 2006Sep 20 2006

Publication series

NameSolid State Phenomena
Volume134
ISSN (Print)1012-0394

Other

Other8th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2006
CountryBelgium
CityAntwerp
Period9/18/069/20/06

Keywords

  • Gas phase etching
  • HF
  • Surface characterization
  • Surface preparation
  • Water

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Materials Science(all)
  • Condensed Matter Physics

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