Abstract
Comparison of misalignment modes associated with metrology data and projection-camera performance can be used to increase the sensitivity of metrology measurements to specific camera-performance specifications such as chief-ray distortion. Selection of measurable misalignment modes in the case of metrology and interesting misalignment modes in the case of camera performance is based on a determination of whether a mode can `fit' into a projection camera given actuator-stroke and mirror tilt bounds. Measurement and interest subspaces are next compared using distance between subspaces. As an example of this type of analysis, we find that exit-pupil wavefront measurements can be made more sensitive to chief-ray distortion if these measurements are collected at field positions outside the ring field of view of an EUVL projection camera.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 663-668 |
| Number of pages | 6 |
| Journal | Proceedings of SPIE - The International Society for Optical Engineering |
| Volume | 3676 |
| Issue number | II |
| State | Published - Jan 1 1999 |
| Event | Proceedings of the 1999 Emerging Lithographic Technologies III - Santa Clara, CA, USA Duration: Mar 15 1999 → Mar 17 1999 |
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ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Computer Science Applications
- Applied Mathematics
- Electrical and Electronic Engineering