Experimental and simulation investigations of acoustic cavitation in megasonic cleaning

Krishna Muralidharan, Manish K Keswani, Hrishikesh Shende, Pierre A Deymier, Srini Raghavan, Florence Eschbach, Archita Sengupta

Research output: Chapter in Book/Report/Conference proceedingConference contribution

8 Citations (Scopus)

Abstract

Extreme ultra-violet (EUV) lithography has become the technique of choice to print the ever-shrinking nanoscale features on the silicon wafer. For successful transfer of patterns on to the wafer, the EUV photomask cannot contain defects greater than 30 nm. Megasonic cleaning is a very successful cleaning technique for removal of particles on photomasks, but also causes a relatively high amount of damage to the fragile EUV photomasks thin film structures. Though it is believed that acoustic cavitation is the primary phenomenon responsible for cleaning as well as pattern damage, a fundamental picture of the acoustic cavitation mechanisms in play during megasonic cleaning has not yet clearly emerged. In this study, we characterize the role of acoustic cavitation in megasonic cleaning by examining the effects of acoustic power densities, cleaning solution properties, and dissolved gas content on cavitation via experiments and molecular dynamics (MD) simulations. MD is an atomistic computation technique capable of modeling atomic-level and nanoscale processes accurately making it well suited to study the effect of cavitation on nano-sized particles and patterns.

Original languageEnglish (US)
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
Volume6517
EditionPART 1
DOIs
StatePublished - 2007
EventEmerging Lithographic Technologies XI - San Jose, CA, United States
Duration: Feb 27 2007Mar 1 2007

Other

OtherEmerging Lithographic Technologies XI
CountryUnited States
CitySan Jose, CA
Period2/27/073/1/07

Fingerprint

cavitation flow
Cavitation
cleaning
Cleaning
Acoustics
Photomasks
acoustics
photomasks
simulation
Molecular dynamics
wafers
molecular dynamics
damage
dissolved gases
Extreme ultraviolet lithography
Silicon wafers
radiant flux density
lithography
Thin films
Defects

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Condensed Matter Physics

Cite this

Muralidharan, K., Keswani, M. K., Shende, H., Deymier, P. A., Raghavan, S., Eschbach, F., & Sengupta, A. (2007). Experimental and simulation investigations of acoustic cavitation in megasonic cleaning. In Proceedings of SPIE - The International Society for Optical Engineering (PART 1 ed., Vol. 6517). [65171E] https://doi.org/10.1117/12.712464

Experimental and simulation investigations of acoustic cavitation in megasonic cleaning. / Muralidharan, Krishna; Keswani, Manish K; Shende, Hrishikesh; Deymier, Pierre A; Raghavan, Srini; Eschbach, Florence; Sengupta, Archita.

Proceedings of SPIE - The International Society for Optical Engineering. Vol. 6517 PART 1. ed. 2007. 65171E.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Muralidharan, K, Keswani, MK, Shende, H, Deymier, PA, Raghavan, S, Eschbach, F & Sengupta, A 2007, Experimental and simulation investigations of acoustic cavitation in megasonic cleaning. in Proceedings of SPIE - The International Society for Optical Engineering. PART 1 edn, vol. 6517, 65171E, Emerging Lithographic Technologies XI, San Jose, CA, United States, 2/27/07. https://doi.org/10.1117/12.712464
Muralidharan K, Keswani MK, Shende H, Deymier PA, Raghavan S, Eschbach F et al. Experimental and simulation investigations of acoustic cavitation in megasonic cleaning. In Proceedings of SPIE - The International Society for Optical Engineering. PART 1 ed. Vol. 6517. 2007. 65171E https://doi.org/10.1117/12.712464
Muralidharan, Krishna ; Keswani, Manish K ; Shende, Hrishikesh ; Deymier, Pierre A ; Raghavan, Srini ; Eschbach, Florence ; Sengupta, Archita. / Experimental and simulation investigations of acoustic cavitation in megasonic cleaning. Proceedings of SPIE - The International Society for Optical Engineering. Vol. 6517 PART 1. ed. 2007.
@inproceedings{e40a08049f094a439b35e6a16f89c2d0,
title = "Experimental and simulation investigations of acoustic cavitation in megasonic cleaning",
abstract = "Extreme ultra-violet (EUV) lithography has become the technique of choice to print the ever-shrinking nanoscale features on the silicon wafer. For successful transfer of patterns on to the wafer, the EUV photomask cannot contain defects greater than 30 nm. Megasonic cleaning is a very successful cleaning technique for removal of particles on photomasks, but also causes a relatively high amount of damage to the fragile EUV photomasks thin film structures. Though it is believed that acoustic cavitation is the primary phenomenon responsible for cleaning as well as pattern damage, a fundamental picture of the acoustic cavitation mechanisms in play during megasonic cleaning has not yet clearly emerged. In this study, we characterize the role of acoustic cavitation in megasonic cleaning by examining the effects of acoustic power densities, cleaning solution properties, and dissolved gas content on cavitation via experiments and molecular dynamics (MD) simulations. MD is an atomistic computation technique capable of modeling atomic-level and nanoscale processes accurately making it well suited to study the effect of cavitation on nano-sized particles and patterns.",
author = "Krishna Muralidharan and Keswani, {Manish K} and Hrishikesh Shende and Deymier, {Pierre A} and Srini Raghavan and Florence Eschbach and Archita Sengupta",
year = "2007",
doi = "10.1117/12.712464",
language = "English (US)",
volume = "6517",
booktitle = "Proceedings of SPIE - The International Society for Optical Engineering",
edition = "PART 1",

}

TY - GEN

T1 - Experimental and simulation investigations of acoustic cavitation in megasonic cleaning

AU - Muralidharan, Krishna

AU - Keswani, Manish K

AU - Shende, Hrishikesh

AU - Deymier, Pierre A

AU - Raghavan, Srini

AU - Eschbach, Florence

AU - Sengupta, Archita

PY - 2007

Y1 - 2007

N2 - Extreme ultra-violet (EUV) lithography has become the technique of choice to print the ever-shrinking nanoscale features on the silicon wafer. For successful transfer of patterns on to the wafer, the EUV photomask cannot contain defects greater than 30 nm. Megasonic cleaning is a very successful cleaning technique for removal of particles on photomasks, but also causes a relatively high amount of damage to the fragile EUV photomasks thin film structures. Though it is believed that acoustic cavitation is the primary phenomenon responsible for cleaning as well as pattern damage, a fundamental picture of the acoustic cavitation mechanisms in play during megasonic cleaning has not yet clearly emerged. In this study, we characterize the role of acoustic cavitation in megasonic cleaning by examining the effects of acoustic power densities, cleaning solution properties, and dissolved gas content on cavitation via experiments and molecular dynamics (MD) simulations. MD is an atomistic computation technique capable of modeling atomic-level and nanoscale processes accurately making it well suited to study the effect of cavitation on nano-sized particles and patterns.

AB - Extreme ultra-violet (EUV) lithography has become the technique of choice to print the ever-shrinking nanoscale features on the silicon wafer. For successful transfer of patterns on to the wafer, the EUV photomask cannot contain defects greater than 30 nm. Megasonic cleaning is a very successful cleaning technique for removal of particles on photomasks, but also causes a relatively high amount of damage to the fragile EUV photomasks thin film structures. Though it is believed that acoustic cavitation is the primary phenomenon responsible for cleaning as well as pattern damage, a fundamental picture of the acoustic cavitation mechanisms in play during megasonic cleaning has not yet clearly emerged. In this study, we characterize the role of acoustic cavitation in megasonic cleaning by examining the effects of acoustic power densities, cleaning solution properties, and dissolved gas content on cavitation via experiments and molecular dynamics (MD) simulations. MD is an atomistic computation technique capable of modeling atomic-level and nanoscale processes accurately making it well suited to study the effect of cavitation on nano-sized particles and patterns.

UR - http://www.scopus.com/inward/record.url?scp=35148894528&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=35148894528&partnerID=8YFLogxK

U2 - 10.1117/12.712464

DO - 10.1117/12.712464

M3 - Conference contribution

VL - 6517

BT - Proceedings of SPIE - The International Society for Optical Engineering

ER -