Experimental investigation of photomask with near-field polarization imaging

Tao Chen, Tom D. Milster, Seung Hune Yang

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Scopus citations

Abstract

Near-field induced polarization imaging with a solid immersion lens (SIL) is used to provide high lateral resolution for both native and induced polarization (cross polarized) images. A new technique is used to obtain height information from the near-field induced polarization image. An AltPSM mask sample is studied with this imaging technique, and compared to imaging with an AFM and a PSI interferometer. Topological data from the near-field induced polarization image are within a few nanometer of the AFM result, without contacting surface. In addition, features due to undercutting the Cr are observable in the induced polarization image.

Original languageEnglish (US)
Title of host publicationPhotomask Technology 2006
DOIs
StatePublished - Dec 1 2006
Event26th Annual BACUS Symposium on Photomask Technology 2006 - Monterey, CA, United States
Duration: Sep 19 2006Sep 22 2006

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume6349 I
ISSN (Print)0277-786X

Other

Other26th Annual BACUS Symposium on Photomask Technology 2006
CountryUnited States
CityMonterey, CA
Period9/19/069/22/06

    Fingerprint

Keywords

  • AltPSM
  • High resolution
  • Near-field
  • Polarization
  • Solid immersion lens (SIL)
  • Topographical image

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this

Chen, T., Milster, T. D., & Yang, S. H. (2006). Experimental investigation of photomask with near-field polarization imaging. In Photomask Technology 2006 [634953] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 6349 I). https://doi.org/10.1117/12.686420