Experimental investigation of solid immersion lens lithography

Tao Chen, Tom Milster, Dongseok Nam, Seung Hune Yang

Research output: Contribution to journalConference article

4 Scopus citations

Abstract

There are several next generation technologies for high resolution lithography, such as ArF wet immersion, F2, EUV, etc. However, these technologies are very expensive because of projection lens and mask costs. Near-field optics using a solid immersion lens (SIL) can meet the requirement of high resolution in a cost-effective way. In this paper, a very compact and inexpensive high resolution system using a SIL is introduced and preliminary experimental results are presented using a 405nm laser diode system. The SIL is used with a modified conventional inverted microscope. The air gap between the SIL flat bottom surface and the wafer is kept less than 50nm. Optical reflected power from SIL bottom and wafer interface is used to control the gap. A high resolution experiment with 405nm wavelength is discussed.

Original languageEnglish (US)
Article number25
Pages (from-to)254-261
Number of pages8
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume5754
Issue numberPART 1
DOIs
StatePublished - Sep 29 2005
EventOptical Microlithography XVIII - San Jose, CA, United States
Duration: Mar 1 2005Mar 4 2005

Keywords

  • Lithography
  • Near-field optics
  • Solid immersion lens

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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