Experiments on scaling in AlxGa1-xAs/GaAs heterostructures under quantum Hall conditions

Stephan W Koch, R. J. Haug, K. V. Klitzing, K. Ploog

Research output: Contribution to journalArticle

137 Citations (Scopus)

Abstract

The influence of repulsive (Be) and attractive (Si) scattering centers on the temperature-dependent half-width of the Shubnikovde Haas peaks B(T) and the maximum of the slope of the Hall resistance xy/B has been investigated at millikelvin temperatures for the two-dimensional electron gas in AlxGa1-xAs/GaAs heterostructures. Both sheet-doped and homogeneously doped samples were studied. In contrast to results reported for InxGa1-xAs/InP heterostructures, where a scaling exponent =0.42±0.04 with BT and (xy/B)maxT- is found and suggested to be universal, our data lead to scaling exponents that systematically increase with decreasing mobility. The transition between the integer filling factor 1 and the fractional filling factor 2/3 has been studied and a scaling behavior observed.

Original languageEnglish (US)
Pages (from-to)6828-6831
Number of pages4
JournalPhysical Review B
Volume43
Issue number8
DOIs
StatePublished - 1991
Externally publishedYes

Fingerprint

Heterojunctions
scaling
Two dimensional electron gas
exponents
Hall resistance
Experiments
Scattering
Temperature
integers
electron gas
slopes
temperature
scattering
gallium arsenide

ASJC Scopus subject areas

  • Condensed Matter Physics

Cite this

Experiments on scaling in AlxGa1-xAs/GaAs heterostructures under quantum Hall conditions. / Koch, Stephan W; Haug, R. J.; Klitzing, K. V.; Ploog, K.

In: Physical Review B, Vol. 43, No. 8, 1991, p. 6828-6831.

Research output: Contribution to journalArticle

Koch, Stephan W ; Haug, R. J. ; Klitzing, K. V. ; Ploog, K. / Experiments on scaling in AlxGa1-xAs/GaAs heterostructures under quantum Hall conditions. In: Physical Review B. 1991 ; Vol. 43, No. 8. pp. 6828-6831.
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