Fabrication and characterization of low-loss optical waveguides using a novel photosensitive polyimide

N. Yurt, K. Mune, R. Naito, T. Fukuoka, A. Mochizuki, K. Matsumoto, G. Meredith, N. Peyghambarian, G. E. Jabbour

Research output: Contribution to journalArticle

8 Scopus citations

Abstract

This paper presents simple fabrication of optical waveguides using a novel photosensitive polyimide (PSPI). PSPI has a glass transition temperature (Tg) of 330 °C and is directly patterned by ultraviolet (UV) exposure and wet-chemical development, lending itself to low-cost fabrication techniques. The fabricated waveguides possess low optical absorption at 1.3 and 1.5 μm. Single and multimode buried ridge waveguides were made and tested, and a 0.4-dB/cm optical propagation loss is measured at 1.55 μm.

Original languageEnglish (US)
Pages (from-to)1291-1294
Number of pages4
JournalJournal of Lightwave Technology
Volume23
Issue number3
DOIs
StatePublished - Mar 1 2005

Keywords

  • Optical communications
  • Optical losses
  • Photosensitive materials
  • Polyimide
  • Polymer waveguides

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

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    Yurt, N., Mune, K., Naito, R., Fukuoka, T., Mochizuki, A., Matsumoto, K., Meredith, G., Peyghambarian, N., & Jabbour, G. E. (2005). Fabrication and characterization of low-loss optical waveguides using a novel photosensitive polyimide. Journal of Lightwave Technology, 23(3), 1291-1294. https://doi.org/10.1109/JLT.2005.843492