Fabrication and Performance of Micron Thick CsI(Tl) Films for X-Ray Imaging Application

Lina Guo; Shuang Liu; Dejun Chen; Shangjian Zhang; Yong Liu; Zhiyong Zhong; Charles M Falco

doi:10.1109/TNS.2016.2567444

Fabrication and Performance of Micron Thick CsI(Tl) Films for X-Ray Imaging Application

Lina Guo, Shuang Liu, Dejun Chen, Shangjian Zhang, Yong Liu, Zhiyong Zhong, Charles M Falco

Optical Sciences, College of

Research output: Contribution to journal › Article › peer-review

4 Scopus citations

Abstract

CsI(Tl) scintillator films with columnar structure are widely applied as the conversion screens for the indirect X-ray imaging. In this work, CsI(Tl) films with different micron thickness were fabricated on glass substrates by the thermal deposition method under the same deposition conditions. The influence of film thickness on the microstructure and crystalline property of the films was studied by scanning electron microscopy (SEM) and X-ray diffraction (XRD). The photoluminescent spectra of the films were measured, which appeared by the bimodal distribution peaking at 550 nm and 740 nm respectively. The radioluminescence and imaging performances were observed by the micron thick films coupled with CCD camera system under X-ray exposure conditions.

Original language	English (US)
Article number	7469406
Pages (from-to)	1827-1831
Number of pages	5
Journal	IEEE Transactions on Nuclear Science
Volume	63
Issue number	3
DOIs	https://doi.org/10.1109/TNS.2016.2567444
State	Published - Jun 1 2016

Keywords

CsI:Tl film
micron thickness
scintillation properties
X-ray imaging

ASJC Scopus subject areas

Nuclear and High Energy Physics
Nuclear Energy and Engineering
Electrical and Electronic Engineering

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abstract = "CsI(Tl) scintillator films with columnar structure are widely applied as the conversion screens for the indirect X-ray imaging. In this work, CsI(Tl) films with different micron thickness were fabricated on glass substrates by the thermal deposition method under the same deposition conditions. The influence of film thickness on the microstructure and crystalline property of the films was studied by scanning electron microscopy (SEM) and X-ray diffraction (XRD). The photoluminescent spectra of the films were measured, which appeared by the bimodal distribution peaking at 550 nm and 740 nm respectively. The radioluminescence and imaging performances were observed by the micron thick films coupled with CCD camera system under X-ray exposure conditions.",

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AU - Zhong, Zhiyong

AU - Falco, Charles M

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