Fabrication and Performance of Micron Thick CsI(Tl) Films for X-Ray Imaging Application

Lina Guo, Shuang Liu, Dejun Chen, Shangjian Zhang, Yong Liu, Zhiyong Zhong, Charles M Falco

Research output: Contribution to journalArticle

3 Scopus citations

Abstract

CsI(Tl) scintillator films with columnar structure are widely applied as the conversion screens for the indirect X-ray imaging. In this work, CsI(Tl) films with different micron thickness were fabricated on glass substrates by the thermal deposition method under the same deposition conditions. The influence of film thickness on the microstructure and crystalline property of the films was studied by scanning electron microscopy (SEM) and X-ray diffraction (XRD). The photoluminescent spectra of the films were measured, which appeared by the bimodal distribution peaking at 550 nm and 740 nm respectively. The radioluminescence and imaging performances were observed by the micron thick films coupled with CCD camera system under X-ray exposure conditions.

Original languageEnglish (US)
Article number7469406
Pages (from-to)1827-1831
Number of pages5
JournalIEEE Transactions on Nuclear Science
Volume63
Issue number3
DOIs
StatePublished - Jun 1 2016

Keywords

  • CsI:Tl film
  • micron thickness
  • scintillation properties
  • X-ray imaging

ASJC Scopus subject areas

  • Nuclear and High Energy Physics
  • Nuclear Energy and Engineering
  • Electrical and Electronic Engineering

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