Fabrication and Performance of Micron Thick CsI(Tl) Films for X-Ray Imaging Application

Lina Guo; Shuang Liu; Dejun Chen; Shangjian Zhang; Yong Liu; Zhiyong Zhong; Charles M. Falco

doi:10.1109/TNS.2016.2567444

Fabrication and Performance of Micron Thick CsI(Tl) Films for X-Ray Imaging Application

Lina Guo, Shuang Liu, Dejun Chen, Shangjian Zhang, Yong Liu, Zhiyong Zhong, Charles M. Falco

Optical Sciences, College of

Research output: Contribution to journal › Article › peer-review

4 Scopus citations

Abstract

CsI(Tl) scintillator films with columnar structure are widely applied as the conversion screens for the indirect X-ray imaging. In this work, CsI(Tl) films with different micron thickness were fabricated on glass substrates by the thermal deposition method under the same deposition conditions. The influence of film thickness on the microstructure and crystalline property of the films was studied by scanning electron microscopy (SEM) and X-ray diffraction (XRD). The photoluminescent spectra of the films were measured, which appeared by the bimodal distribution peaking at 550 nm and 740 nm respectively. The radioluminescence and imaging performances were observed by the micron thick films coupled with CCD camera system under X-ray exposure conditions.

Original language	English (US)
Article number	7469406
Pages (from-to)	1827-1831
Number of pages	5
Journal	IEEE Transactions on Nuclear Science
Volume	63
Issue number	3
DOIs	https://doi.org/10.1109/TNS.2016.2567444
State	Published - Jun 2016

Keywords

CsI:Tl film
X-ray imaging
micron thickness
scintillation properties

ASJC Scopus subject areas

Nuclear and High Energy Physics
Nuclear Energy and Engineering
Electrical and Electronic Engineering

Access to Document

10.1109/TNS.2016.2567444

Cite this

@article{5d6a1ddfabe940fc8742df84914adf4d,

title = "Fabrication and Performance of Micron Thick CsI(Tl) Films for X-Ray Imaging Application",

abstract = "CsI(Tl) scintillator films with columnar structure are widely applied as the conversion screens for the indirect X-ray imaging. In this work, CsI(Tl) films with different micron thickness were fabricated on glass substrates by the thermal deposition method under the same deposition conditions. The influence of film thickness on the microstructure and crystalline property of the films was studied by scanning electron microscopy (SEM) and X-ray diffraction (XRD). The photoluminescent spectra of the films were measured, which appeared by the bimodal distribution peaking at 550 nm and 740 nm respectively. The radioluminescence and imaging performances were observed by the micron thick films coupled with CCD camera system under X-ray exposure conditions.",

keywords = "CsI:Tl film, X-ray imaging, micron thickness, scintillation properties",

author = "Lina Guo and Shuang Liu and Dejun Chen and Shangjian Zhang and Yong Liu and Zhiyong Zhong and Falco, {Charles M.}",

note = "Funding Information: This work was supported by 973 Program of China (2012CB315701), the National Natural Science Foundation of China (Grant 61177035), Sichuan Provincial International Cooperation Project (2013HH0002) and Sichuan Provincial Science and Technology Support Project (12ZC0245), as well as CCD Research Center of China Electronics. Publisher Copyright: {\textcopyright} 2016 IEEE. Copyright: Copyright 2016 Elsevier B.V., All rights reserved.",

year = "2016",

month = jun,

doi = "10.1109/TNS.2016.2567444",

language = "English (US)",

volume = "63",

pages = "1827--1831",

journal = "IEEE Transactions on Nuclear Science",

issn = "0018-9499",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

number = "3",

}

TY - JOUR

T1 - Fabrication and Performance of Micron Thick CsI(Tl) Films for X-Ray Imaging Application

AU - Guo, Lina

AU - Liu, Shuang

AU - Chen, Dejun

AU - Zhang, Shangjian

AU - Liu, Yong

AU - Zhong, Zhiyong

AU - Falco, Charles M.

N1 - Funding Information: This work was supported by 973 Program of China (2012CB315701), the National Natural Science Foundation of China (Grant 61177035), Sichuan Provincial International Cooperation Project (2013HH0002) and Sichuan Provincial Science and Technology Support Project (12ZC0245), as well as CCD Research Center of China Electronics. Publisher Copyright: © 2016 IEEE. Copyright: Copyright 2016 Elsevier B.V., All rights reserved.

PY - 2016/6

Y1 - 2016/6

N2 - CsI(Tl) scintillator films with columnar structure are widely applied as the conversion screens for the indirect X-ray imaging. In this work, CsI(Tl) films with different micron thickness were fabricated on glass substrates by the thermal deposition method under the same deposition conditions. The influence of film thickness on the microstructure and crystalline property of the films was studied by scanning electron microscopy (SEM) and X-ray diffraction (XRD). The photoluminescent spectra of the films were measured, which appeared by the bimodal distribution peaking at 550 nm and 740 nm respectively. The radioluminescence and imaging performances were observed by the micron thick films coupled with CCD camera system under X-ray exposure conditions.

AB - CsI(Tl) scintillator films with columnar structure are widely applied as the conversion screens for the indirect X-ray imaging. In this work, CsI(Tl) films with different micron thickness were fabricated on glass substrates by the thermal deposition method under the same deposition conditions. The influence of film thickness on the microstructure and crystalline property of the films was studied by scanning electron microscopy (SEM) and X-ray diffraction (XRD). The photoluminescent spectra of the films were measured, which appeared by the bimodal distribution peaking at 550 nm and 740 nm respectively. The radioluminescence and imaging performances were observed by the micron thick films coupled with CCD camera system under X-ray exposure conditions.

KW - CsI:Tl film

KW - X-ray imaging

KW - micron thickness

KW - scintillation properties

UR - http://www.scopus.com/inward/record.url?scp=84978229499&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84978229499&partnerID=8YFLogxK

U2 - 10.1109/TNS.2016.2567444

DO - 10.1109/TNS.2016.2567444

M3 - Article

AN - SCOPUS:84978229499

VL - 63

SP - 1827

EP - 1831

JO - IEEE Transactions on Nuclear Science

JF - IEEE Transactions on Nuclear Science

SN - 0018-9499

IS - 3

M1 - 7469406

ER -

Fabrication and Performance of Micron Thick CsI(Tl) Films for X-Ray Imaging Application

Abstract

Keywords

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this