Abstract
CsI(Tl) scintillator films with columnar structure are widely applied as the conversion screens for the indirect X-ray imaging. In this work, CsI(Tl) films with different micron thickness were fabricated on glass substrates by the thermal deposition method under the same deposition conditions. The influence of film thickness on the microstructure and crystalline property of the films was studied by scanning electron microscopy (SEM) and X-ray diffraction (XRD). The photoluminescent spectra of the films were measured, which appeared by the bimodal distribution peaking at 550 nm and 740 nm respectively. The radioluminescence and imaging performances were observed by the micron thick films coupled with CCD camera system under X-ray exposure conditions.
Original language | English (US) |
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Article number | 7469406 |
Pages (from-to) | 1827-1831 |
Number of pages | 5 |
Journal | IEEE Transactions on Nuclear Science |
Volume | 63 |
Issue number | 3 |
DOIs | |
State | Published - Jun 1 2016 |
Keywords
- CsI:Tl film
- micron thickness
- scintillation properties
- X-ray imaging
ASJC Scopus subject areas
- Nuclear and High Energy Physics
- Nuclear Energy and Engineering
- Electrical and Electronic Engineering