Fabrication and uniformity issues in λ/4 shifted DFB laser arrays using e-beam generated contact grating masks

Donald M. Tennant, Thomas L. Koch

Research output: Contribution to journalArticle

9 Scopus citations

Abstract

We describe the fabrication and performance of λ/4 shifted DFB laser arrays made using electron beam-generated near field holographic grating masks. Precision requirements for these masks are discussed. We also examine the physical phenomena that contribute to wavelength variations in DFB lasers. Projections are made regarding the epitaxial thickness, composition, and waveguide etching control required to achieve a source wavelength absolute reproducibility of ±0.1 nm.

Original languageEnglish (US)
Pages (from-to)331-350
Number of pages20
JournalMicroelectronic Engineering
Volume32
Issue number1-4 SPEC. ISS.
DOIs
StatePublished - Sep 1996
Externally publishedYes

Keywords

  • DFB laser array
  • Grating mask
  • Near-field holography
  • Wavelength division multiplexing

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering

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