Fabrication and uniformity issues in λ/4 shifted DFB laser arrays using e-beam generated contact grating masks

Donald M. Tennant, Thomas L Koch

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

We describe the fabrication and performance of λ/4 shifted DFB laser arrays made using electron beam-generated near field holographic grating masks. Precision requirements for these masks are discussed. We also examine the physical phenomena that contribute to wavelength variations in DFB lasers. Projections are made regarding the epitaxial thickness, composition, and waveguide etching control required to achieve a source wavelength absolute reproducibility of ±0.1 nm.

Original languageEnglish (US)
Pages (from-to)331-350
Number of pages20
JournalMicroelectronic Engineering
Volume32
Issue number1-4 SPEC. ISS.
DOIs
StatePublished - Sep 1996
Externally publishedYes

Fingerprint

laser arrays
Distributed feedback lasers
Masks
masks
gratings
Holographic gratings
Fabrication
Wavelength
fabrication
wavelengths
Electron beams
Etching
near fields
Waveguides
projection
etching
electron beams
waveguides
requirements
Chemical analysis

Keywords

  • DFB laser array
  • Grating mask
  • Near-field holography
  • Wavelength division multiplexing

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films
  • Atomic and Molecular Physics, and Optics

Cite this

Fabrication and uniformity issues in λ/4 shifted DFB laser arrays using e-beam generated contact grating masks. / Tennant, Donald M.; Koch, Thomas L.

In: Microelectronic Engineering, Vol. 32, No. 1-4 SPEC. ISS., 09.1996, p. 331-350.

Research output: Contribution to journalArticle

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