Fabrication of circular gratings on InP By e-beam lithography and reactive ion etching

M. Fallahi, C. Wu, C. Maritan, K. Fox, C. Blaauw

Research output: Chapter in Book/Report/Conference proceedingConference contribution

4 Scopus citations

Abstract

We demonstrate the possibility of fabricating second and first-order circular gratings on InGaAsP/InP waveguides by electron beam (E-beam) lithography of a single PMMA resist layer and two-step reactive ion etching (RIE).

Original languageEnglish (US)
Title of host publication1st Summer Topical Meeting on Epitaxial Materials and In-Situ Processing for Optoelectronic Devices, LEOSST 1991
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages14-15
Number of pages2
ISBN (Electronic)0879426187
DOIs
StatePublished - 1991
Event1st Summer Topical Meeting on Epitaxial Materials and In-Situ Processing for Optoelectronic Devices, LEOSST 1991 - Newport Beach, United States
Duration: Jul 29 1991Jul 31 1991

Publication series

NameLEOS Summer Topical Meeting
Volume1991-July
ISSN (Print)1099-4742

Conference

Conference1st Summer Topical Meeting on Epitaxial Materials and In-Situ Processing for Optoelectronic Devices, LEOSST 1991
CountryUnited States
CityNewport Beach
Period7/29/917/31/91

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Electrical and Electronic Engineering

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    Fallahi, M., Wu, C., Maritan, C., Fox, K., & Blaauw, C. (1991). Fabrication of circular gratings on InP By e-beam lithography and reactive ion etching. In 1st Summer Topical Meeting on Epitaxial Materials and In-Situ Processing for Optoelectronic Devices, LEOSST 1991 (pp. 14-15). [638990] (LEOS Summer Topical Meeting; Vol. 1991-July). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/LEOSST.1991.638990