@inproceedings{5c3c40c8f4fc482ba504accec35fed15,
title = "Fabrication of polymer-derived ceramic nanostructures by imprint lithography",
abstract = "The conventional technique used for manufacturing miniaturized ceramic components is the powder route which typically does not allow the fabrication of feature sizes smaller than 0.1mm. With the availability of preceramic polymers, processed by various lithographic methods, it is possible to realize feature sizes below 1μm in size on polymer derived ceramics (PDC). Recently, sub-500nm structures have been fabricated by soft lithography which uses a sacrificial mold. This method is not commercially viable for the production of sub-100nm feature devices in large numbers due to the tedious pre- and post processing steps involved. Currently, no studies are present in the direction of simply printing the nanostructures below 100nm on Si 3N 4/SiO 2 to the best of our knowledge. Here, we present an easy method of fabricating sub-100nm photonic devices in polysilazane which is a precursor for preparing Si 3N 4 and SiC.",
keywords = "Imprint lithography, Photonic structures, Polymer-derived ceramics, Sub-100nm features",
author = "B. Duong and P. Gangopadhyay and J. Brent and S. Seraphin and Loutfy, {R. O.} and J. Thomas",
year = "2012",
month = aug,
day = "20",
language = "English (US)",
isbn = "9781466562745",
series = "Technical Proceedings of the 2012 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2012",
pages = "761--763",
booktitle = "Technical Proceedings of the 2012 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2012",
note = "Nanotechnology 2012: Advanced Materials, CNTs, Particles, Films and Composites - 2012 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2012 ; Conference date: 18-06-2012 Through 21-06-2012",
}