Abstract
The conventional technique used for manufacturing miniaturized ceramic components is the powder route which typically does not allow the fabrication of feature sizes smaller than 0.1mm. With the availability of preceramic polymers, processed by various lithographic methods, it is possible to realize feature sizes below 1μm in size on polymer derived ceramics (PDC). Recently, sub-500nm structures have been fabricated by soft lithography which uses a sacrificial mold. This method is not commercially viable for the production of sub-100nm feature devices in large numbers due to the tedious pre- and post processing steps involved. Currently, no studies are present in the direction of simply printing the nanostructures below 100nm on Si 3N 4/SiO 2 to the best of our knowledge. Here, we present an easy method of fabricating sub-100nm photonic devices in polysilazane which is a precursor for preparing Si 3N 4 and SiC.
| Original language | English (US) |
|---|---|
| Title of host publication | Technical Proceedings of the 2012 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2012 |
| Pages | 761-763 |
| Number of pages | 3 |
| State | Published - 2012 |
| Event | Nanotechnology 2012: Advanced Materials, CNTs, Particles, Films and Composites - 2012 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2012 - Santa Clara, CA, United States Duration: Jun 18 2012 → Jun 21 2012 |
Other
| Other | Nanotechnology 2012: Advanced Materials, CNTs, Particles, Films and Composites - 2012 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2012 |
|---|---|
| Country | United States |
| City | Santa Clara, CA |
| Period | 6/18/12 → 6/21/12 |
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Keywords
- Imprint lithography
- Photonic structures
- Polymer-derived ceramics
- Sub-100nm features
ASJC Scopus subject areas
- Ceramics and Composites
- Surfaces, Coatings and Films
Cite this
Fabrication of polymer-derived ceramic nanostructures by imprint lithography. / Duong, B.; Gangopadhyay, Palash; Brent, J.; Seraphin, Supapan; Loutfy, R. O.; Thomas, J.
Technical Proceedings of the 2012 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2012. 2012. p. 761-763.Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
}
TY - GEN
T1 - Fabrication of polymer-derived ceramic nanostructures by imprint lithography
AU - Duong, B.
AU - Gangopadhyay, Palash
AU - Brent, J.
AU - Seraphin, Supapan
AU - Loutfy, R. O.
AU - Thomas, J.
PY - 2012
Y1 - 2012
N2 - The conventional technique used for manufacturing miniaturized ceramic components is the powder route which typically does not allow the fabrication of feature sizes smaller than 0.1mm. With the availability of preceramic polymers, processed by various lithographic methods, it is possible to realize feature sizes below 1μm in size on polymer derived ceramics (PDC). Recently, sub-500nm structures have been fabricated by soft lithography which uses a sacrificial mold. This method is not commercially viable for the production of sub-100nm feature devices in large numbers due to the tedious pre- and post processing steps involved. Currently, no studies are present in the direction of simply printing the nanostructures below 100nm on Si 3N 4/SiO 2 to the best of our knowledge. Here, we present an easy method of fabricating sub-100nm photonic devices in polysilazane which is a precursor for preparing Si 3N 4 and SiC.
AB - The conventional technique used for manufacturing miniaturized ceramic components is the powder route which typically does not allow the fabrication of feature sizes smaller than 0.1mm. With the availability of preceramic polymers, processed by various lithographic methods, it is possible to realize feature sizes below 1μm in size on polymer derived ceramics (PDC). Recently, sub-500nm structures have been fabricated by soft lithography which uses a sacrificial mold. This method is not commercially viable for the production of sub-100nm feature devices in large numbers due to the tedious pre- and post processing steps involved. Currently, no studies are present in the direction of simply printing the nanostructures below 100nm on Si 3N 4/SiO 2 to the best of our knowledge. Here, we present an easy method of fabricating sub-100nm photonic devices in polysilazane which is a precursor for preparing Si 3N 4 and SiC.
KW - Imprint lithography
KW - Photonic structures
KW - Polymer-derived ceramics
KW - Sub-100nm features
UR - http://www.scopus.com/inward/record.url?scp=84864990341&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84864990341&partnerID=8YFLogxK
M3 - Conference contribution
SN - 9781466562745
SP - 761
EP - 763
BT - Technical Proceedings of the 2012 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2012
ER -