Fate of CeO2 nanoparticles during laboratory-scale activated sludge treatment

Francisco Gomez-Rivera, Dustin Brown, James A Field, Farhang Shadman, Maria Reye Sierra Alvarez

Research output: Contribution to journalArticle

Abstract

The semiconductor industry is a major consumer of engineered nanoparticles since slurries containing silica, alumina, and ceria oxides are utilized extensively for the chemical-mechanical planarization (CMP) of wafers. Little is known about the fate of abrasive CMP nanoparticles during conventional wastewater treatment. With the objective to get a better understanding of the behavior of nanoparticles during biological treatment of wastewater, a laboratory-scale aerobic activated sludge treatment was set up to evaluate the fate of cerium oxide nanoparticles. The results obtained show that only a small fraction of the cerium oxide nanoparticles entering the treatment system escaped with the treated effluent (< 4.5%). Mechanisms contributing to the removal of the ceria included partitioning onto the microbial sludge floccules as well as destabilization of the nanoparticle dispersions by constituents present in the wastewater.

Original languageEnglish (US)
JournalSESHA Journal: Semiconductor Environmental Safety and Health Association
Volume810
StatePublished - Jun 2010

Fingerprint

activated sludge
Nanoparticles
nanoparticles
cerium oxides
Chemical mechanical polishing
cerium
Cerium compounds
oxide
Cerium
Oxides
Wastewater
semiconductor industry
wastewater
slurries
sludge
effluents
destabilization
Slurries
abrasives
Dispersions

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Condensed Matter Physics
  • Environmental Science(all)

Cite this

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title = "Fate of CeO2 nanoparticles during laboratory-scale activated sludge treatment",
abstract = "The semiconductor industry is a major consumer of engineered nanoparticles since slurries containing silica, alumina, and ceria oxides are utilized extensively for the chemical-mechanical planarization (CMP) of wafers. Little is known about the fate of abrasive CMP nanoparticles during conventional wastewater treatment. With the objective to get a better understanding of the behavior of nanoparticles during biological treatment of wastewater, a laboratory-scale aerobic activated sludge treatment was set up to evaluate the fate of cerium oxide nanoparticles. The results obtained show that only a small fraction of the cerium oxide nanoparticles entering the treatment system escaped with the treated effluent (< 4.5{\%}). Mechanisms contributing to the removal of the ceria included partitioning onto the microbial sludge floccules as well as destabilization of the nanoparticle dispersions by constituents present in the wastewater.",
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AU - Gomez-Rivera, Francisco

AU - Brown, Dustin

AU - Field, James A

AU - Shadman, Farhang

AU - Sierra Alvarez, Maria Reye

PY - 2010/6

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