Fate of CeO2 nanoparticles during laboratory-scale activated sludge treatment

Francisco Gomez-Rivera, Dustin Brown, James Field, Farhang Shadman, Reyes Sierra-Alvarez

Research output: Contribution to journalArticle

Abstract

The semiconductor industry is a major consumer of engineered nanoparticles since slurries containing silica, alumina, and ceria oxides are utilized extensively for the chemical-mechanical planarization (CMP) of wafers. Little is known about the fate of abrasive CMP nanoparticles during conventional wastewater treatment. With the objective to get a better understanding of the behavior of nanoparticles during biological treatment of wastewater, a laboratory-scale aerobic activated sludge treatment was set up to evaluate the fate of cerium oxide nanoparticles. The results obtained show that only a small fraction of the cerium oxide nanoparticles entering the treatment system escaped with the treated effluent (< 4.5%). Mechanisms contributing to the removal of the ceria included partitioning onto the microbial sludge floccules as well as destabilization of the nanoparticle dispersions by constituents present in the wastewater.

Original languageEnglish (US)
JournalSESHA Journal: Semiconductor Environmental Safety and Health Association
Volume810
StatePublished - Jun 1 2010

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Environmental Science(all)
  • Electrical and Electronic Engineering

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