Fiber-coupled 3-DOF interferometer for euv lithography stage metrology

Jonathan D. Ellis, Steven Gillmer, Chen Wang, Richard Smith, Shane C. Woody, Joshua Tarbutton

Research output: Chapter in Book/Report/Conference proceedingConference contribution

5 Scopus citations
Original languageEnglish (US)
Title of host publicationProceedings - ASPE 2012 Summer Topical Meeting
Subtitle of host publicationPrecision Engineering and Mechatronics Supporting the Semiconductor Industry
Pages36-41
Number of pages6
StatePublished - Dec 1 2012
Externally publishedYes
EventASPE 2012 Summer Topical Meeting on Precision Engineering and Mechatronics Suporting the Semiconductor Industry - Berkeley, CA, United States
Duration: Jun 24 2012Jun 26 2012

Publication series

NameProceedings - ASPE 2012 Summer Topical Meeting: Precision Engineering and Mechatronics Supporting the Semiconductor Industry
Volume53

Conference

ConferenceASPE 2012 Summer Topical Meeting on Precision Engineering and Mechatronics Suporting the Semiconductor Industry
CountryUnited States
CityBerkeley, CA
Period6/24/126/26/12

ASJC Scopus subject areas

  • Engineering (miscellaneous)

Cite this

Ellis, J. D., Gillmer, S., Wang, C., Smith, R., Woody, S. C., & Tarbutton, J. (2012). Fiber-coupled 3-DOF interferometer for euv lithography stage metrology. In Proceedings - ASPE 2012 Summer Topical Meeting: Precision Engineering and Mechatronics Supporting the Semiconductor Industry (pp. 36-41). (Proceedings - ASPE 2012 Summer Topical Meeting: Precision Engineering and Mechatronics Supporting the Semiconductor Industry; Vol. 53).