Five-wave-mixing spectroscopy of ultrafast electron dynamics at a Si(001) surface

C. Voelkmann, M. Reichelt, T. Meier, S. W. Koch, U. Höfer

Research output: Contribution to journalArticlepeer-review

32 Scopus citations


A new class of surface-sensitive, time-resolved experiments that is complementary to two-photon photoemission (2PPE) was introduced. Two well-established techniques: four-wave mixing (4WM) and second-harmonic generation (SHG) were combined to obtain a five-wave-mixing (5WM) process. The potential of the technique was demonstrated with results obtained for a Si(001) surface using ultrashort 13 fs pulses. The observed delayed rise and decay of the 5WM signal on time scales of 50 and 250 fs were both interpreted in terms of scattering within the Ddown band of the reconstructed surface.

Original languageEnglish (US)
Article number127405
Pages (from-to)127405-1-127405-4
JournalPhysical review letters
Issue number12
StatePublished - Mar 26 2004

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Fingerprint Dive into the research topics of 'Five-wave-mixing spectroscopy of ultrafast electron dynamics at a Si(001) surface'. Together they form a unique fingerprint.

Cite this