Fluid dynamics analysis of atmospheric thermal silicon oxidation reactors using dispersion models

A. Philipossian, K. Van Wormer

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Scopus citations

Abstract

The Residence Time Distribution (RTD) technique combined with mass spectroscopic Residual Gas Analysis (RGA) is employed, for the first time, to study the nature of nonideal gas flow in atmospheric thermal silicon oxidation reactors. The RTD results are interpreted in terms of various dispersion models. Higher flow rates improve plug flow conditions by reducing the Dispersion Number, D. In cases where baffles are not used upstream of the wafers, the Finite Length System (FLS) model agrees most closely with the experimental data due the presence of macroscopic variations in flow caused by the entering gas jet. When baffles are present, the Semi-Infinite Length System (SILS) model is shown to apply. Increasing the number of baffles and the longitudinal location results in lower D. The trends are explained theoretically by determining the extent of natural convection which has been shown to be the major obstacle towards achieving plug flow conditions in thermal silicon oxidation reactors.

Original languageEnglish (US)
Title of host publication1992 International Technical Digest on Electron Devices Meeting, IEDM 1992
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages185-188
Number of pages4
ISBN (Electronic)0780308174
DOIs
StatePublished - Jan 1 1992
Externally publishedYes
Event1992 International Technical Digest on Electron Devices Meeting, IEDM 1992 - San Francisco, United States
Duration: Dec 13 1992Dec 16 1992

Publication series

NameTechnical Digest - International Electron Devices Meeting, IEDM
Volume1992-December
ISSN (Print)0163-1918

Conference

Conference1992 International Technical Digest on Electron Devices Meeting, IEDM 1992
CountryUnited States
CitySan Francisco
Period12/13/9212/16/92

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Electrical and Electronic Engineering
  • Materials Chemistry

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    Philipossian, A., & Van Wormer, K. (1992). Fluid dynamics analysis of atmospheric thermal silicon oxidation reactors using dispersion models. In 1992 International Technical Digest on Electron Devices Meeting, IEDM 1992 (pp. 185-188). [307338] (Technical Digest - International Electron Devices Meeting, IEDM; Vol. 1992-December). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/IEDM.1992.307338