Focus drilling and attenuated phase shift mask for subwavelength contact window printing using positive and negative resists

Stanley K H Pau, L. E. Trimble, J. W. Blatchford, G. P. Watson, J. Frackoviak, R. Cirelli, O. Nalamasu

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

We have investigated the process latitude and resolution limit of printing contact windows using a high numerical aperture KrF stepper and attenuated phase shift mask (APSM). We show that both . positive and negative resists can be used depending on the size of the window on the mask. The advantages and disadvantages of using the positive and negative resists are presented. A combination of APSM and focus drilling are shown to extend the focus latitude of subwavelength window printing.

Original languageEnglish (US)
Pages (from-to)2499-2506
Number of pages8
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume17
Issue number6
StatePublished - 1999
Externally publishedYes

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drilling
Phase shift
printing
Printing
Masks
electric contacts
Drilling
phase shift
masks
numerical aperture

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Physics and Astronomy (miscellaneous)
  • Surfaces and Interfaces

Cite this

Focus drilling and attenuated phase shift mask for subwavelength contact window printing using positive and negative resists. / Pau, Stanley K H; Trimble, L. E.; Blatchford, J. W.; Watson, G. P.; Frackoviak, J.; Cirelli, R.; Nalamasu, O.

In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 17, No. 6, 1999, p. 2499-2506.

Research output: Contribution to journalArticle

@article{05859c47118d41bfa02231e1b88c608b,
title = "Focus drilling and attenuated phase shift mask for subwavelength contact window printing using positive and negative resists",
abstract = "We have investigated the process latitude and resolution limit of printing contact windows using a high numerical aperture KrF stepper and attenuated phase shift mask (APSM). We show that both . positive and negative resists can be used depending on the size of the window on the mask. The advantages and disadvantages of using the positive and negative resists are presented. A combination of APSM and focus drilling are shown to extend the focus latitude of subwavelength window printing.",
author = "Pau, {Stanley K H} and Trimble, {L. E.} and Blatchford, {J. W.} and Watson, {G. P.} and J. Frackoviak and R. Cirelli and O. Nalamasu",
year = "1999",
language = "English (US)",
volume = "17",
pages = "2499--2506",
journal = "Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena",
issn = "1071-1023",
publisher = "AVS Science and Technology Society",
number = "6",

}

TY - JOUR

T1 - Focus drilling and attenuated phase shift mask for subwavelength contact window printing using positive and negative resists

AU - Pau, Stanley K H

AU - Trimble, L. E.

AU - Blatchford, J. W.

AU - Watson, G. P.

AU - Frackoviak, J.

AU - Cirelli, R.

AU - Nalamasu, O.

PY - 1999

Y1 - 1999

N2 - We have investigated the process latitude and resolution limit of printing contact windows using a high numerical aperture KrF stepper and attenuated phase shift mask (APSM). We show that both . positive and negative resists can be used depending on the size of the window on the mask. The advantages and disadvantages of using the positive and negative resists are presented. A combination of APSM and focus drilling are shown to extend the focus latitude of subwavelength window printing.

AB - We have investigated the process latitude and resolution limit of printing contact windows using a high numerical aperture KrF stepper and attenuated phase shift mask (APSM). We show that both . positive and negative resists can be used depending on the size of the window on the mask. The advantages and disadvantages of using the positive and negative resists are presented. A combination of APSM and focus drilling are shown to extend the focus latitude of subwavelength window printing.

UR - http://www.scopus.com/inward/record.url?scp=0033269850&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0033269850&partnerID=8YFLogxK

M3 - Article

AN - SCOPUS:0033269850

VL - 17

SP - 2499

EP - 2506

JO - Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena

JF - Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena

SN - 1071-1023

IS - 6

ER -