Focused beam scatterometry for deep subwavelength metrology

Thomas G. Brown, Miguel A. Alonso, Anthony Vella, Michael J. Theisen, Stephen T. Head, Steven R. Gillmer, Jonathan D. Ellis

Research output: Chapter in Book/Report/Conference proceedingConference contribution

6 Citations (Scopus)

Abstract

It is known that far-field scattered light requires a priori sample information in order to reconstruct nm-scale information such as is required in semiconductor metrology. We describe an approach to scatterometry that uses unconventional polarization states in the pupil of a high NA objective lens. We call this focused beam scatterometry; we will discuss the sensitivity limits to this approach and how it relates to micro-ellipsometry as well as low-NA scatterometry.

Original languageEnglish (US)
Title of host publicationThree-Dimensional and Multidimensional Microscopy
Subtitle of host publicationImage Acquisition and Processing XXI
PublisherSPIE
ISBN (Print)9780819498625
DOIs
StatePublished - Jan 1 2014
Externally publishedYes
EventThree-Dimensional and Multidimensional Microscopy: Image Acquisition and Processing XXI - San Francisco, CA, United States
Duration: Feb 3 2014Feb 6 2014

Publication series

NameProgress in Biomedical Optics and Imaging - Proceedings of SPIE
Volume8949
ISSN (Print)1605-7422

Conference

ConferenceThree-Dimensional and Multidimensional Microscopy: Image Acquisition and Processing XXI
CountryUnited States
CitySan Francisco, CA
Period2/3/142/6/14

Fingerprint

Semiconductors
Ellipsometry
Pupil
metrology
Lenses
Polarization
Semiconductor materials
Light
pupils
ellipsometry
far fields
lenses
sensitivity
polarization

Keywords

  • Microscopy
  • Polarization Control
  • Pupil Engineering
  • Spatial Light Modulators

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Biomaterials
  • Atomic and Molecular Physics, and Optics
  • Radiology Nuclear Medicine and imaging

Cite this

Brown, T. G., Alonso, M. A., Vella, A., Theisen, M. J., Head, S. T., Gillmer, S. R., & Ellis, J. D. (2014). Focused beam scatterometry for deep subwavelength metrology. In Three-Dimensional and Multidimensional Microscopy: Image Acquisition and Processing XXI [89490Y] (Progress in Biomedical Optics and Imaging - Proceedings of SPIE; Vol. 8949). SPIE. https://doi.org/10.1117/12.2045651

Focused beam scatterometry for deep subwavelength metrology. / Brown, Thomas G.; Alonso, Miguel A.; Vella, Anthony; Theisen, Michael J.; Head, Stephen T.; Gillmer, Steven R.; Ellis, Jonathan D.

Three-Dimensional and Multidimensional Microscopy: Image Acquisition and Processing XXI. SPIE, 2014. 89490Y (Progress in Biomedical Optics and Imaging - Proceedings of SPIE; Vol. 8949).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Brown, TG, Alonso, MA, Vella, A, Theisen, MJ, Head, ST, Gillmer, SR & Ellis, JD 2014, Focused beam scatterometry for deep subwavelength metrology. in Three-Dimensional and Multidimensional Microscopy: Image Acquisition and Processing XXI., 89490Y, Progress in Biomedical Optics and Imaging - Proceedings of SPIE, vol. 8949, SPIE, Three-Dimensional and Multidimensional Microscopy: Image Acquisition and Processing XXI, San Francisco, CA, United States, 2/3/14. https://doi.org/10.1117/12.2045651
Brown TG, Alonso MA, Vella A, Theisen MJ, Head ST, Gillmer SR et al. Focused beam scatterometry for deep subwavelength metrology. In Three-Dimensional and Multidimensional Microscopy: Image Acquisition and Processing XXI. SPIE. 2014. 89490Y. (Progress in Biomedical Optics and Imaging - Proceedings of SPIE). https://doi.org/10.1117/12.2045651
Brown, Thomas G. ; Alonso, Miguel A. ; Vella, Anthony ; Theisen, Michael J. ; Head, Stephen T. ; Gillmer, Steven R. ; Ellis, Jonathan D. / Focused beam scatterometry for deep subwavelength metrology. Three-Dimensional and Multidimensional Microscopy: Image Acquisition and Processing XXI. SPIE, 2014. (Progress in Biomedical Optics and Imaging - Proceedings of SPIE).
@inproceedings{84da428a4e1742f5818c601836b967d0,
title = "Focused beam scatterometry for deep subwavelength metrology",
abstract = "It is known that far-field scattered light requires a priori sample information in order to reconstruct nm-scale information such as is required in semiconductor metrology. We describe an approach to scatterometry that uses unconventional polarization states in the pupil of a high NA objective lens. We call this focused beam scatterometry; we will discuss the sensitivity limits to this approach and how it relates to micro-ellipsometry as well as low-NA scatterometry.",
keywords = "Microscopy, Polarization Control, Pupil Engineering, Spatial Light Modulators",
author = "Brown, {Thomas G.} and Alonso, {Miguel A.} and Anthony Vella and Theisen, {Michael J.} and Head, {Stephen T.} and Gillmer, {Steven R.} and Ellis, {Jonathan D.}",
year = "2014",
month = "1",
day = "1",
doi = "10.1117/12.2045651",
language = "English (US)",
isbn = "9780819498625",
series = "Progress in Biomedical Optics and Imaging - Proceedings of SPIE",
publisher = "SPIE",
booktitle = "Three-Dimensional and Multidimensional Microscopy",

}

TY - GEN

T1 - Focused beam scatterometry for deep subwavelength metrology

AU - Brown, Thomas G.

AU - Alonso, Miguel A.

AU - Vella, Anthony

AU - Theisen, Michael J.

AU - Head, Stephen T.

AU - Gillmer, Steven R.

AU - Ellis, Jonathan D.

PY - 2014/1/1

Y1 - 2014/1/1

N2 - It is known that far-field scattered light requires a priori sample information in order to reconstruct nm-scale information such as is required in semiconductor metrology. We describe an approach to scatterometry that uses unconventional polarization states in the pupil of a high NA objective lens. We call this focused beam scatterometry; we will discuss the sensitivity limits to this approach and how it relates to micro-ellipsometry as well as low-NA scatterometry.

AB - It is known that far-field scattered light requires a priori sample information in order to reconstruct nm-scale information such as is required in semiconductor metrology. We describe an approach to scatterometry that uses unconventional polarization states in the pupil of a high NA objective lens. We call this focused beam scatterometry; we will discuss the sensitivity limits to this approach and how it relates to micro-ellipsometry as well as low-NA scatterometry.

KW - Microscopy

KW - Polarization Control

KW - Pupil Engineering

KW - Spatial Light Modulators

UR - http://www.scopus.com/inward/record.url?scp=84900414327&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84900414327&partnerID=8YFLogxK

U2 - 10.1117/12.2045651

DO - 10.1117/12.2045651

M3 - Conference contribution

AN - SCOPUS:84900414327

SN - 9780819498625

T3 - Progress in Biomedical Optics and Imaging - Proceedings of SPIE

BT - Three-Dimensional and Multidimensional Microscopy

PB - SPIE

ER -