Focused beam scatterometry for deep subwavelength metrology

Thomas G. Brown, Miguel A. Alonso, Anthony Vella, Michael J. Theisen, Stephen T. Head, Steven R. Gillmer, Jonathan D. Ellis

Research output: Chapter in Book/Report/Conference proceedingConference contribution

8 Scopus citations

Abstract

It is known that far-field scattered light requires a priori sample information in order to reconstruct nm-scale information such as is required in semiconductor metrology. We describe an approach to scatterometry that uses unconventional polarization states in the pupil of a high NA objective lens. We call this focused beam scatterometry; we will discuss the sensitivity limits to this approach and how it relates to micro-ellipsometry as well as low-NA scatterometry.

Original languageEnglish (US)
Title of host publicationThree-Dimensional and Multidimensional Microscopy
Subtitle of host publicationImage Acquisition and Processing XXI
PublisherSPIE
ISBN (Print)9780819498625
DOIs
StatePublished - Jan 1 2014
Externally publishedYes
EventThree-Dimensional and Multidimensional Microscopy: Image Acquisition and Processing XXI - San Francisco, CA, United States
Duration: Feb 3 2014Feb 6 2014

Publication series

NameProgress in Biomedical Optics and Imaging - Proceedings of SPIE
Volume8949
ISSN (Print)1605-7422

Conference

ConferenceThree-Dimensional and Multidimensional Microscopy: Image Acquisition and Processing XXI
CountryUnited States
CitySan Francisco, CA
Period2/3/142/6/14

Keywords

  • Microscopy
  • Polarization Control
  • Pupil Engineering
  • Spatial Light Modulators

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Biomaterials
  • Atomic and Molecular Physics, and Optics
  • Radiology Nuclear Medicine and imaging

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