Fundamentals and applications of plasma cleaning

Dinesh P.R. Thanu, Endu Sekhar Srinadhu, Mingrui Zhao, Nikhil V. Dole, Manish Keswani

Research output: Chapter in Book/Report/Conference proceedingChapter

2 Scopus citations

Abstract

Surface treatment is necessary in a host of industries to attain a defect-free surface. In medical and semiconductor fields, for example, clean surfaces are essential to provide good adhesion across multiple interfaces. Conventional treatment methods such as wet chemical cleaning or solvent degreasing can effectively increase the wettability of surfaces and thereby the adhesion, or decrease the contact resistivity. However, a massive disadvantage of these techniques is that they leave the treated surface contaminated with traces of process chemicals and generate residues that are difficult to dispose of and are harmful to the environment. Due to the health concerns of these techniques, dry cleaning techniques such as plasma cleaning are currently being explored by researchers around the globe. In this chapter, a comprehensive review of the current and past work on plasma cleaning applications along with the fundamentals and advantages of plasma cleaning will be discussed.

Original languageEnglish (US)
Title of host publicationDevelopments in Surface Contamination and Cleaning
Subtitle of host publicationApplications of Cleaning Techniques Volume 11
PublisherElsevier
Pages289-353
Number of pages65
ISBN (Electronic)9780128155776
DOIs
StatePublished - Jan 1 2018

Keywords

  • Archaeological artefacts
  • Cleaning in electron microscopy applications
  • Cleaning optical components
  • Conservation
  • Medical applications
  • Particle removal
  • Photovoltaic solar cell cleaning
  • Plasma cleaning
  • Restoration
  • Silicon cleaning

ASJC Scopus subject areas

  • Engineering(all)
  • Materials Science(all)

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