Fused silica masks for printing uniform and phase adjusted gratings for distributed feedback lasers

G. Pakulski, R. Moore, C. Maritan, F. Shepherd, M. Fallahi, I. Templeton, G. Champion

Research output: Contribution to journalArticle

16 Scopus citations

Abstract

A method for producing durable fused silica self-interference grating photomasks is described. These masks allow repeated printing of both uniform and phase adjusted gratings. Periods as fine as 200 nm have been demonstrated. The fabrication of these masks via holographic and focused ion beam lithography and their use as a lithography tool are explained. Distributed feedback lasers, with gratings made by this technique, were produced. These lasers operated in a single longitudinal mode at a wavelength of either 1.55 or 1.3 μm.

Original languageEnglish (US)
Pages (from-to)222-224
Number of pages3
JournalApplied Physics Letters
Volume62
Issue number3
DOIs
StatePublished - 1993

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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