High density lithography using attenuated phase shift mask and negative resist

Stanley K H Pau, R. Cirelli, K. Bolan, A. G. Timko, J. Frackoviak, G. P. Watson, L. E. Trimble, J. W. Blatchford, O. Nalamasu

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Citations (Scopus)

Abstract

A technique to print high-density windows using attenuated phase shift mask, negative photoresist and ArF exposure tool is demonstrated. The technique can be implemented types. It use sub-wavelength features and offers higher packing density compared with the use of binary masks and positive photoresists.

Original languageEnglish (US)
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
PublisherSociety of Photo-Optical Instrumentation Engineers
Volume4000
StatePublished - 2000
Externally publishedYes
EventOptical Microlithography XIII - Santa Clara, CA, USA
Duration: Mar 1 2000Mar 3 2000

Other

OtherOptical Microlithography XIII
CitySanta Clara, CA, USA
Period3/1/003/3/00

Fingerprint

Photoresists
photoresists
Phase shift
Lithography
Masks
phase shift
masks
lithography
packing density
Wavelength
wavelengths

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Condensed Matter Physics

Cite this

Pau, S. K. H., Cirelli, R., Bolan, K., Timko, A. G., Frackoviak, J., Watson, G. P., ... Nalamasu, O. (2000). High density lithography using attenuated phase shift mask and negative resist. In Proceedings of SPIE - The International Society for Optical Engineering (Vol. 4000). Society of Photo-Optical Instrumentation Engineers.

High density lithography using attenuated phase shift mask and negative resist. / Pau, Stanley K H; Cirelli, R.; Bolan, K.; Timko, A. G.; Frackoviak, J.; Watson, G. P.; Trimble, L. E.; Blatchford, J. W.; Nalamasu, O.

Proceedings of SPIE - The International Society for Optical Engineering. Vol. 4000 Society of Photo-Optical Instrumentation Engineers, 2000.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Pau, SKH, Cirelli, R, Bolan, K, Timko, AG, Frackoviak, J, Watson, GP, Trimble, LE, Blatchford, JW & Nalamasu, O 2000, High density lithography using attenuated phase shift mask and negative resist. in Proceedings of SPIE - The International Society for Optical Engineering. vol. 4000, Society of Photo-Optical Instrumentation Engineers, Optical Microlithography XIII, Santa Clara, CA, USA, 3/1/00.
Pau SKH, Cirelli R, Bolan K, Timko AG, Frackoviak J, Watson GP et al. High density lithography using attenuated phase shift mask and negative resist. In Proceedings of SPIE - The International Society for Optical Engineering. Vol. 4000. Society of Photo-Optical Instrumentation Engineers. 2000
Pau, Stanley K H ; Cirelli, R. ; Bolan, K. ; Timko, A. G. ; Frackoviak, J. ; Watson, G. P. ; Trimble, L. E. ; Blatchford, J. W. ; Nalamasu, O. / High density lithography using attenuated phase shift mask and negative resist. Proceedings of SPIE - The International Society for Optical Engineering. Vol. 4000 Society of Photo-Optical Instrumentation Engineers, 2000.
@inproceedings{a57f634c223f47458d5ed13e5b5bc7c4,
title = "High density lithography using attenuated phase shift mask and negative resist",
abstract = "A technique to print high-density windows using attenuated phase shift mask, negative photoresist and ArF exposure tool is demonstrated. The technique can be implemented types. It use sub-wavelength features and offers higher packing density compared with the use of binary masks and positive photoresists.",
author = "Pau, {Stanley K H} and R. Cirelli and K. Bolan and Timko, {A. G.} and J. Frackoviak and Watson, {G. P.} and Trimble, {L. E.} and Blatchford, {J. W.} and O. Nalamasu",
year = "2000",
language = "English (US)",
volume = "4000",
booktitle = "Proceedings of SPIE - The International Society for Optical Engineering",
publisher = "Society of Photo-Optical Instrumentation Engineers",

}

TY - GEN

T1 - High density lithography using attenuated phase shift mask and negative resist

AU - Pau, Stanley K H

AU - Cirelli, R.

AU - Bolan, K.

AU - Timko, A. G.

AU - Frackoviak, J.

AU - Watson, G. P.

AU - Trimble, L. E.

AU - Blatchford, J. W.

AU - Nalamasu, O.

PY - 2000

Y1 - 2000

N2 - A technique to print high-density windows using attenuated phase shift mask, negative photoresist and ArF exposure tool is demonstrated. The technique can be implemented types. It use sub-wavelength features and offers higher packing density compared with the use of binary masks and positive photoresists.

AB - A technique to print high-density windows using attenuated phase shift mask, negative photoresist and ArF exposure tool is demonstrated. The technique can be implemented types. It use sub-wavelength features and offers higher packing density compared with the use of binary masks and positive photoresists.

UR - http://www.scopus.com/inward/record.url?scp=0033699229&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0033699229&partnerID=8YFLogxK

M3 - Conference contribution

VL - 4000

BT - Proceedings of SPIE - The International Society for Optical Engineering

PB - Society of Photo-Optical Instrumentation Engineers

ER -