High-power, continuous-wave, scalable, single-frequency 852nm laser source for 213nm generation

Yushi Kaneda, Tsuyoshi Tago, Toshiaki Sasa, Masahiro Sasaura, Hiroaki Nakao, Junji Hirohashi, Yasunori Furukawa

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Scopus citations

Abstract

We developed a high-power, continuous-wave (CW), single-frequency 852nm laser source, for the purpose of fourth harmonic generation at 213nm. Our approach is the doubly resonant sum-frequency mixing (DRSFM) with two fiber sources. An in-house single-frequency master oscillator at 1907nm is amplified by an in-house clad-pumped amplifier to 5W, and a commercial single-frequency master oscillator at 1540nm is amplified by a commercial amplifier to 10W. The two beams are combined via a dichroic mirror to a single beam before incident on a dual-wavelength resonator, consisting of one set of dual-wavelength mirrors. The external resonator is locked to the 1907nm laser frequency, and the frequency of the 1540nm is locked to the resonator, realizing double-resonance. With a periodically-poled stoichiometric lithium tantalate in the resonator, the sum-frequency at 852nm is efficiently generated. All 3 waves are in the same polarization (e-ray), allowing the effective use of Brewster-cut device, eliminating reflection loss for all wavelengths without any antireflection coatings. With 4.6W at 1907nm and 7.7W at 1540nm incident onto the resonator, 5.2W at 852nm was generated, representing the efficiency of greater than 40%. The experimental result indicates our current setup will be more efficient with higher input powers at 1907nm. With both fiber sources at 1540nm and 1907nm being scalable in output power, the output at 852nm is also scalable. By the forth harmonic of 852nm, 0.456 W CW 213nm was generated.

Original languageEnglish (US)
Title of host publicationNonlinear Frequency Generation and Conversion
Subtitle of host publicationMaterials and Devices XVIII
EditorsPeter G. Schunemann, Kenneth L. Schepler
PublisherSPIE
ISBN (Electronic)9781510624467
DOIs
StatePublished - 2019
EventNonlinear Frequency Generation and Conversion: Materials and Devices XVIII 2019 - San Francisco, United States
Duration: Feb 5 2019Feb 7 2019

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume10902
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Conference

ConferenceNonlinear Frequency Generation and Conversion: Materials and Devices XVIII 2019
CountryUnited States
CitySan Francisco
Period2/5/192/7/19

Keywords

  • Fiber lasers
  • Frequency doubled lasers
  • Harmonic generation and mixing
  • Ultraviolet lasers

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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  • Cite this

    Kaneda, Y., Tago, T., Sasa, T., Sasaura, M., Nakao, H., Hirohashi, J., & Furukawa, Y. (2019). High-power, continuous-wave, scalable, single-frequency 852nm laser source for 213nm generation. In P. G. Schunemann, & K. L. Schepler (Eds.), Nonlinear Frequency Generation and Conversion: Materials and Devices XVIII [1090203] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 10902). SPIE. https://doi.org/10.1117/12.2506231