Hot stage for x-ray diffraction of ceramic systems

T. P. Seward, F. N. Molea, D. R. Uhlmann

Research output: Contribution to journalArticle

3 Scopus citations

Abstract

A resistance type heating device is described which adapts a standard high temperature x-ray camera for use in diffraction studies where uniformity of temperature is required. With this device, a volume 6×6×3 mm can be maintained within ±6°C at a temperature of 550°C.

Original languageEnglish (US)
Pages (from-to)1851-1852
Number of pages2
JournalReview of Scientific Instruments
Volume36
Issue number12
DOIs
StatePublished - Dec 1 1965
Externally publishedYes

ASJC Scopus subject areas

  • Instrumentation

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