Hot stage for x-ray diffraction of ceramic systems

T. P. Seward, F. N. Molea, Donald R Uhlmann

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

A resistance type heating device is described which adapts a standard high temperature x-ray camera for use in diffraction studies where uniformity of temperature is required. With this device, a volume 6×6×3 mm can be maintained within ±6°C at a temperature of 550°C.

Original languageEnglish (US)
Pages (from-to)1851-1852
Number of pages2
JournalReview of Scientific Instruments
Volume36
Issue number12
DOIs
StatePublished - 1965
Externally publishedYes

Fingerprint

x ray diffraction
Diffraction
ceramics
X rays
cameras
Temperature
heating
temperature
Cameras
diffraction
Heating
x rays

ASJC Scopus subject areas

  • Instrumentation
  • Physics and Astronomy (miscellaneous)

Cite this

Hot stage for x-ray diffraction of ceramic systems. / Seward, T. P.; Molea, F. N.; Uhlmann, Donald R.

In: Review of Scientific Instruments, Vol. 36, No. 12, 1965, p. 1851-1852.

Research output: Contribution to journalArticle

Seward, T. P. ; Molea, F. N. ; Uhlmann, Donald R. / Hot stage for x-ray diffraction of ceramic systems. In: Review of Scientific Instruments. 1965 ; Vol. 36, No. 12. pp. 1851-1852.
@article{7c7b2c2a3f3044c891ae705d93cf2063,
title = "Hot stage for x-ray diffraction of ceramic systems",
abstract = "A resistance type heating device is described which adapts a standard high temperature x-ray camera for use in diffraction studies where uniformity of temperature is required. With this device, a volume 6×6×3 mm can be maintained within ±6°C at a temperature of 550°C.",
author = "Seward, {T. P.} and Molea, {F. N.} and Uhlmann, {Donald R}",
year = "1965",
doi = "10.1063/1.1719479",
language = "English (US)",
volume = "36",
pages = "1851--1852",
journal = "Review of Scientific Instruments",
issn = "0034-6748",
publisher = "American Institute of Physics Publising LLC",
number = "12",

}

TY - JOUR

T1 - Hot stage for x-ray diffraction of ceramic systems

AU - Seward, T. P.

AU - Molea, F. N.

AU - Uhlmann, Donald R

PY - 1965

Y1 - 1965

N2 - A resistance type heating device is described which adapts a standard high temperature x-ray camera for use in diffraction studies where uniformity of temperature is required. With this device, a volume 6×6×3 mm can be maintained within ±6°C at a temperature of 550°C.

AB - A resistance type heating device is described which adapts a standard high temperature x-ray camera for use in diffraction studies where uniformity of temperature is required. With this device, a volume 6×6×3 mm can be maintained within ±6°C at a temperature of 550°C.

UR - http://www.scopus.com/inward/record.url?scp=0042219336&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0042219336&partnerID=8YFLogxK

U2 - 10.1063/1.1719479

DO - 10.1063/1.1719479

M3 - Article

AN - SCOPUS:0042219336

VL - 36

SP - 1851

EP - 1852

JO - Review of Scientific Instruments

JF - Review of Scientific Instruments

SN - 0034-6748

IS - 12

ER -