Illumination artifacts in hyper-NA vector imaging

Jun Zhang, Yongsik Kim, Seung Hune Yang, Thomas D Milster

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

Off-axis polarized monopole illumination is applied to a hyper-numerical-aperture (NA) (NA>1) microscopic system. Illumination artifacts due to vector effects are observed, which are asymmetric and depend on illumination conditions. A model based on rigorous coupled wave theory is used to simulate image profiles for dielectric, semiconductor, and metal gratings with different monopole locations and polarization states. A solid immersion lens microscope is used to image different types of samples including MoSi photomask, patterned silicon wafer, and chrome photomask. The experimental images are in good agreement with simulation results.

Original languageEnglish (US)
Pages (from-to)2272-2284
Number of pages13
JournalJournal of the Optical Society of America A: Optics and Image Science, and Vision
Volume27
Issue number10
DOIs
StatePublished - Oct 1 2010

Fingerprint

numerical aperture
Lighting
Artifacts
artifacts
Photomasks
photomasks
illumination
Imaging techniques
monopoles
Semiconductors
Immersion
Silicon
Silicon wafers
submerging
Lenses
chromium
Microscopes
Metals
microscopes
lenses

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Electronic, Optical and Magnetic Materials
  • Computer Vision and Pattern Recognition

Cite this

Illumination artifacts in hyper-NA vector imaging. / Zhang, Jun; Kim, Yongsik; Yang, Seung Hune; Milster, Thomas D.

In: Journal of the Optical Society of America A: Optics and Image Science, and Vision, Vol. 27, No. 10, 01.10.2010, p. 2272-2284.

Research output: Contribution to journalArticle

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