Illumination artifacts in hyper-NA vector imaging

Jun Zhang, Yongsik Kim, Seung Hune Yang, Tom D. Milster

Research output: Contribution to journalArticle

5 Scopus citations

Abstract

Off-axis polarized monopole illumination is applied to a hyper-numerical-aperture (NA) (NA>1) microscopic system. Illumination artifacts due to vector effects are observed, which are asymmetric and depend on illumination conditions. A model based on rigorous coupled wave theory is used to simulate image profiles for dielectric, semiconductor, and metal gratings with different monopole locations and polarization states. A solid immersion lens microscope is used to image different types of samples including MoSi photomask, patterned silicon wafer, and chrome photomask. The experimental images are in good agreement with simulation results.

Original languageEnglish (US)
Pages (from-to)2272-2284
Number of pages13
JournalJournal of the Optical Society of America A: Optics and Image Science, and Vision
Volume27
Issue number10
DOIs
StatePublished - Oct 1 2010

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Computer Vision and Pattern Recognition

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