Image formation by use of the geometrical theory of diffraction

Andrew Khoh, Ganesh S. Samudra, Yihong Wu, Thomas D Milster, Byoung Il Choi

Research output: Contribution to journalArticle

8 Citations (Scopus)

Abstract

A deeper understanding of imaging behavior is needed with the widespread adoption of optical proximity correction in advanced lithography processes. To gain insight into the printing behavior of different mask pattern configurations, we derive edge-based and vertex-based image models by combining concepts contained in the geometrical theory of diffraction and Hopkins's image model. The models are scalar models and apply to planar, perfectly conducting mask objects.

Original languageEnglish (US)
Pages (from-to)959-967
Number of pages9
JournalJournal of the Optical Society of America A: Optics and Image Science, and Vision
Volume21
Issue number6
DOIs
StatePublished - 2004

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Masks
Image processing
Diffraction
Printing
Lithography
Imaging techniques

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Computer Vision and Pattern Recognition

Cite this

Image formation by use of the geometrical theory of diffraction. / Khoh, Andrew; Samudra, Ganesh S.; Wu, Yihong; Milster, Thomas D; Choi, Byoung Il.

In: Journal of the Optical Society of America A: Optics and Image Science, and Vision, Vol. 21, No. 6, 2004, p. 959-967.

Research output: Contribution to journalArticle

Khoh, Andrew ; Samudra, Ganesh S. ; Wu, Yihong ; Milster, Thomas D ; Choi, Byoung Il. / Image formation by use of the geometrical theory of diffraction. In: Journal of the Optical Society of America A: Optics and Image Science, and Vision. 2004 ; Vol. 21, No. 6. pp. 959-967.
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