Imaging properties of a patterned rough surface: Effects of defocus

Neil A. Beaudry, Tom D. Milster

Research output: Contribution to journalArticle

1 Scopus citations

Abstract

A theoretical investigation of the effects of imaging a patterned rough surface through focus is performed, and the statistics of the image plane irradiance, as well as those of the image pattern printed in a threshold-type photoresist, are investigated. It is demonstrated that the line edge roughness in the printed image increases substantially as the image plane is moved out of focus, for both fully and partially coherent optical systems. Furthermore, the increase in line edge roughness occurs in what is considered to be an otherwise acceptable depth of focus for an ideal system.

Original languageEnglish (US)
Pages (from-to)1-10
Number of pages10
JournalOptical Engineering
Volume44
Issue number6
DOIs
StatePublished - Jun 1 2005

Keywords

  • Focus
  • Imaging
  • Microlithography
  • Roughness

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Engineering(all)

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