IMEC clean: A new concept for particle and metal removal on Si surfaces

M. Meuris, P. W. Mertens, A. Opdebeeck, H. F. Schmidt, M. Depas, G. Vereecke, M. M. Heyns, A. Philipossian

Research output: Contribution to specialist publicationArticle

53 Scopus citations

Abstract

This article describes the IMEC clean concept, a simple two-step cleaning method based on oxidation and oxide removal. This clean has excellent particle and metal removal efficiencies and minimal surface roughening. Electrical breakdown measurements show very good gate-oxide integrity as well.

Original languageEnglish (US)
Volume38
No7
Specialist publicationSolid State Technology
StatePublished - Jul 1 1995
Externally publishedYes

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Electrical and Electronic Engineering
  • Materials Chemistry

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  • Cite this

    Meuris, M., Mertens, P. W., Opdebeeck, A., Schmidt, H. F., Depas, M., Vereecke, G., Heyns, M. M., & Philipossian, A. (1995). IMEC clean: A new concept for particle and metal removal on Si surfaces. Solid State Technology, 38(7).