IMEC clean

A new concept for particle and metal removal on Si surfaces

M. Meuris, P. W. Mertens, A. Opdebeeck, H. F. Schmidt, M. Depas, G. Vereecke, M. M. Heyns, Ara Philipossian

Research output: Contribution to journalArticle

53 Citations (Scopus)

Abstract

This article describes the IMEC clean concept, a simple two-step cleaning method based on oxidation and oxide removal. This clean has excellent particle and metal removal efficiencies and minimal surface roughening. Electrical breakdown measurements show very good gate-oxide integrity as well.

Original languageEnglish (US)
JournalSolid State Technology
Volume38
Issue number7
StatePublished - Jul 1995
Externally publishedYes

Fingerprint

Oxides
Metals
minimal surfaces
oxides
electrical faults
metals
integrity
cleaning
Cleaning
Oxidation
oxidation

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Physics and Astronomy (miscellaneous)
  • Condensed Matter Physics

Cite this

Meuris, M., Mertens, P. W., Opdebeeck, A., Schmidt, H. F., Depas, M., Vereecke, G., ... Philipossian, A. (1995). IMEC clean: A new concept for particle and metal removal on Si surfaces. Solid State Technology, 38(7).

IMEC clean : A new concept for particle and metal removal on Si surfaces. / Meuris, M.; Mertens, P. W.; Opdebeeck, A.; Schmidt, H. F.; Depas, M.; Vereecke, G.; Heyns, M. M.; Philipossian, Ara.

In: Solid State Technology, Vol. 38, No. 7, 07.1995.

Research output: Contribution to journalArticle

Meuris, M, Mertens, PW, Opdebeeck, A, Schmidt, HF, Depas, M, Vereecke, G, Heyns, MM & Philipossian, A 1995, 'IMEC clean: A new concept for particle and metal removal on Si surfaces', Solid State Technology, vol. 38, no. 7.
Meuris M, Mertens PW, Opdebeeck A, Schmidt HF, Depas M, Vereecke G et al. IMEC clean: A new concept for particle and metal removal on Si surfaces. Solid State Technology. 1995 Jul;38(7).
Meuris, M. ; Mertens, P. W. ; Opdebeeck, A. ; Schmidt, H. F. ; Depas, M. ; Vereecke, G. ; Heyns, M. M. ; Philipossian, Ara. / IMEC clean : A new concept for particle and metal removal on Si surfaces. In: Solid State Technology. 1995 ; Vol. 38, No. 7.
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