Implications of wafer size scale -up on frictional, thermal and kinetic attributes of ILD CMP process

D. Rosales-Yeomans, L. Borucki, T. Doi, L. Lujan, K. Ichikawa, A. Philipossian

Research output: Contribution to conferencePaperpeer-review

2 Scopus citations

Abstract

Experiments were performed on a novel 200 mm tribometer in which friction force was acquired in two directions, giving a complete resolution of the force vector in the CMP process. A thermal study of the pad surface was conducted using an infrared video camera to simultaneously measure temperature changes. A Langmuir-Hinshelwood model with a reaction temperature based on a flash heating hypothesis was applied to the experimental data to evaluate the chemical and mechanical contributions during ILD CMP. The results obtained from the 200 mm tribometer were compared to those from a 100 mm tribometer. Results showed that scaling up from 100 to 200 mm caused a transition from a mechanically-limited regime, in which it was still possible to detect thermal effects, to a higher degree of mechanical limitation where it was no longer possible to detect thermal effects.

Original languageEnglish (US)
Pages188-193
Number of pages6
StatePublished - Dec 1 2005
Event22nd International VLSI Multilevel Interconnection Conference, VMIC 2005 - Fremont, CA, United States
Duration: Oct 4 2005Oct 6 2005

Other

Other22nd International VLSI Multilevel Interconnection Conference, VMIC 2005
CountryUnited States
CityFremont, CA
Period10/4/0510/6/05

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering

Fingerprint Dive into the research topics of 'Implications of wafer size scale -up on frictional, thermal and kinetic attributes of ILD CMP process'. Together they form a unique fingerprint.

Cite this