Improved focusing-and-deflection columns

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

Our earlier design procedures for constructing quadrupole columns are further expanded to include octupole corrector units and 'octupole' deflectors with no third-order harmonics. The additional complications are finer partitioning of the plates and increased number of voltage controllers. Two sample designs, one having only the additional octupole deflectors and one having both the deflectors and the correctors, are presented and compared to our previous quadrupole system. The additional octupole components are shown to be capable of increasing the current density from 30% to more than 300% for a four-plate system, designed to focus and scan the electron beam over a circular area of 0.25 mm radius. The electron beam is assumed to have an initial divergence of ±2.3 mrad, an initial energy of 6 kV, a total energy spread of 1 eV, and a final acceleration of 30 keV. These systems are then slightly reoptimized for a superficial comparison with the commercially available column by Micrion Corporation. The numerical results indicate a potential for substantial improvements, demonstrating the power of this design procedure. Finally, a discussion is presented on how the individual components can interact with each other to reduce the various aberrations.

Original languageEnglish (US)
Pages (from-to)1496-1507
Number of pages12
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume13
Issue number4
DOIs
StatePublished - Jul 1995

Fingerprint

Electron beams
Aberrations
Current density
Controllers
Electric potential
Industry

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Improved focusing-and-deflection columns. / Mui, P. H.; Szilagyi, Miklos N.

In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 13, No. 4, 07.1995, p. 1496-1507.

Research output: Contribution to journalArticle

@article{d021fe87ebb0488185d1d52f910f0ff5,
title = "Improved focusing-and-deflection columns",
abstract = "Our earlier design procedures for constructing quadrupole columns are further expanded to include octupole corrector units and 'octupole' deflectors with no third-order harmonics. The additional complications are finer partitioning of the plates and increased number of voltage controllers. Two sample designs, one having only the additional octupole deflectors and one having both the deflectors and the correctors, are presented and compared to our previous quadrupole system. The additional octupole components are shown to be capable of increasing the current density from 30{\%} to more than 300{\%} for a four-plate system, designed to focus and scan the electron beam over a circular area of 0.25 mm radius. The electron beam is assumed to have an initial divergence of ±2.3 mrad, an initial energy of 6 kV, a total energy spread of 1 eV, and a final acceleration of 30 keV. These systems are then slightly reoptimized for a superficial comparison with the commercially available column by Micrion Corporation. The numerical results indicate a potential for substantial improvements, demonstrating the power of this design procedure. Finally, a discussion is presented on how the individual components can interact with each other to reduce the various aberrations.",
author = "Mui, {P. H.} and Szilagyi, {Miklos N}",
year = "1995",
month = "7",
doi = "10.1116/1.588177",
language = "English (US)",
volume = "13",
pages = "1496--1507",
journal = "Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena",
issn = "1071-1023",
publisher = "AVS Science and Technology Society",
number = "4",

}

TY - JOUR

T1 - Improved focusing-and-deflection columns

AU - Mui, P. H.

AU - Szilagyi, Miklos N

PY - 1995/7

Y1 - 1995/7

N2 - Our earlier design procedures for constructing quadrupole columns are further expanded to include octupole corrector units and 'octupole' deflectors with no third-order harmonics. The additional complications are finer partitioning of the plates and increased number of voltage controllers. Two sample designs, one having only the additional octupole deflectors and one having both the deflectors and the correctors, are presented and compared to our previous quadrupole system. The additional octupole components are shown to be capable of increasing the current density from 30% to more than 300% for a four-plate system, designed to focus and scan the electron beam over a circular area of 0.25 mm radius. The electron beam is assumed to have an initial divergence of ±2.3 mrad, an initial energy of 6 kV, a total energy spread of 1 eV, and a final acceleration of 30 keV. These systems are then slightly reoptimized for a superficial comparison with the commercially available column by Micrion Corporation. The numerical results indicate a potential for substantial improvements, demonstrating the power of this design procedure. Finally, a discussion is presented on how the individual components can interact with each other to reduce the various aberrations.

AB - Our earlier design procedures for constructing quadrupole columns are further expanded to include octupole corrector units and 'octupole' deflectors with no third-order harmonics. The additional complications are finer partitioning of the plates and increased number of voltage controllers. Two sample designs, one having only the additional octupole deflectors and one having both the deflectors and the correctors, are presented and compared to our previous quadrupole system. The additional octupole components are shown to be capable of increasing the current density from 30% to more than 300% for a four-plate system, designed to focus and scan the electron beam over a circular area of 0.25 mm radius. The electron beam is assumed to have an initial divergence of ±2.3 mrad, an initial energy of 6 kV, a total energy spread of 1 eV, and a final acceleration of 30 keV. These systems are then slightly reoptimized for a superficial comparison with the commercially available column by Micrion Corporation. The numerical results indicate a potential for substantial improvements, demonstrating the power of this design procedure. Finally, a discussion is presented on how the individual components can interact with each other to reduce the various aberrations.

UR - http://www.scopus.com/inward/record.url?scp=0029343947&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0029343947&partnerID=8YFLogxK

U2 - 10.1116/1.588177

DO - 10.1116/1.588177

M3 - Article

AN - SCOPUS:0029343947

VL - 13

SP - 1496

EP - 1507

JO - Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena

JF - Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena

SN - 1071-1023

IS - 4

ER -