In situ and real-time metrology during rinsing of micro- and nano-structures

Jun Yan, Kedar Dhane, Bert Vermeire, Farhang Shadman

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

A new technology, called electro-chemical residue sensor (ECRS), has been developed for the in situ and real-time measurement of the residual impurities left on the wafer surface and in the fine structures of patterned wafers during typical rinse processes. The key components of this technology, which consist of the sensor hardware and a process model, are described. The testing results of the ECRS show that the residual impurity concentration is significantly different from what is typically provided by the bulk water resistivity, which is usually employed for determining the progress of the rinse. As a case study, the new metrology method has been applied to the removal of sulfate ions from patterned wafers; the importance of various surface interactions, charge effects, and transport processes is determined. Two examples of the use of the ECRS for the development of novel rinse recipes to reduce water usage are also discussed.

Original languageEnglish (US)
Pages (from-to)199-205
Number of pages7
JournalMicroelectronic Engineering
Volume86
Issue number2
DOIs
StatePublished - Feb 2009

Fingerprint

metrology
microstructure
Microstructure
sensors
Sensors
wafers
Impurities
impurities
Water
Time measurement
surface reactions
water
Sulfates
sulfates
hardware
fine structure
time measurement
Ions
Hardware
electrical resistivity

Keywords

  • Cleaning
  • Metrology
  • Rinse model
  • Sensor
  • Wafer rinsing
  • Water usage

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics

Cite this

In situ and real-time metrology during rinsing of micro- and nano-structures. / Yan, Jun; Dhane, Kedar; Vermeire, Bert; Shadman, Farhang.

In: Microelectronic Engineering, Vol. 86, No. 2, 02.2009, p. 199-205.

Research output: Contribution to journalArticle

Yan, Jun ; Dhane, Kedar ; Vermeire, Bert ; Shadman, Farhang. / In situ and real-time metrology during rinsing of micro- and nano-structures. In: Microelectronic Engineering. 2009 ; Vol. 86, No. 2. pp. 199-205.
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