In situ and real-time metrology during rinsing of micro- and nano-structures

Jun Yan, Kedar Dhane, Bert Vermeire, Farhang Shadman

Research output: Contribution to journalArticle

9 Scopus citations

Abstract

A new technology, called electro-chemical residue sensor (ECRS), has been developed for the in situ and real-time measurement of the residual impurities left on the wafer surface and in the fine structures of patterned wafers during typical rinse processes. The key components of this technology, which consist of the sensor hardware and a process model, are described. The testing results of the ECRS show that the residual impurity concentration is significantly different from what is typically provided by the bulk water resistivity, which is usually employed for determining the progress of the rinse. As a case study, the new metrology method has been applied to the removal of sulfate ions from patterned wafers; the importance of various surface interactions, charge effects, and transport processes is determined. Two examples of the use of the ECRS for the development of novel rinse recipes to reduce water usage are also discussed.

Original languageEnglish (US)
Pages (from-to)199-205
Number of pages7
JournalMicroelectronic Engineering
Volume86
Issue number2
DOIs
StatePublished - Feb 1 2009

Keywords

  • Cleaning
  • Metrology
  • Rinse model
  • Sensor
  • Wafer rinsing
  • Water usage

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering

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