In-Situ FTIR Kinetic Study in the Silylation of Low-k Films with Hexamethyldisilazane Dissolved in Supercritical CO2

Eduardo Vyhmeister, Héctor Valdés-González, Lorenzo Reyes-Bozo, Roman Rodríguez-Maecker, Anthony J Muscat, L. Antonio Estévez, David Suleiman

Research output: Contribution to journalArticle

1 Scopus citations

Abstract

In-situ Fourier transform infrared spectroscopy measurements were obtained by using an innovative equipment to study the heterogeneous reaction between a hydrolyzed porous methylsilsesquioxane film and hexamethyldisilazane (HMDS) dissolved in CO2 at supercritical conditions. Gas and solid infrared signatures were separated to obtain kinetic information of the heterogeneous reaction. A two-step reaction mechanism was observed: a fast first step controlled by kinetics and a second step controlled by the diffusion of the HMDS inside the porous material. Infrared information was used to derive a rate law expression of the silylation reaction between HMDS and Si-OH. A first order of reaction relative to the concentration of hydrophilic sites was observed with activation energy of 51.85 ± 1.25 kJ/mol.

Original languageEnglish (US)
Pages (from-to)908-916
Number of pages9
JournalChemical Engineering Communications
Volume203
Issue number7
DOIs
StatePublished - Jul 2 2016

Keywords

  • HMDS
  • Kinetics
  • Reaction engineering
  • Semiconductors
  • Silylation
  • Supercritical fluids

ASJC Scopus subject areas

  • Chemical Engineering(all)
  • Chemistry(all)

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