In situ monitoring and universal modelling of sacrificial PSG etching using hydrofluoric acid

Jianqiang Liu, Yu Chong Tai, Jiajing Lee, Kim Cheok Pong, Yitshak Zohar, Chih Ming Ho

Research output: Chapter in Book/Report/Conference proceedingConference contribution

58 Scopus citations

Abstract

A video system is designed to monitor the etching of sacrificial phosphosilicate-glass (PSG) microchannels in-situ accurately using hydrofluoric acid (HF). An universal model, which predicts accurately the etching length vs. time over a wide range of HF concentration (3-49 wt%), is identified. In addition to diffusion, this model is based on a first-and-second order chemical reaction mechanism. It is found that the PSG microchannel etching rate is HF is sensitive to channel thickness but not width. Finally, bubble formation and movement inside the etched microchannels are observed. Most of the generated bubbles are mobile and can enhance the etching rate.

Original languageEnglish (US)
Title of host publicationIEEE Micro Electro Mechanical Systems
PublisherPubl by IEEE
Pages71-76
Number of pages6
ISBN (Print)0780309588
StatePublished - Jan 1 1993
Externally publishedYes
EventProceedings of the 1993 IEEE Micro Electro Mechanical Systems - MEMS - Fort Lauderdale, FL, USA
Duration: Feb 7 1993Feb 10 1993

Publication series

NameIEEE Micro Electro Mechanical Systems

Other

OtherProceedings of the 1993 IEEE Micro Electro Mechanical Systems - MEMS
CityFort Lauderdale, FL, USA
Period2/7/932/10/93

ASJC Scopus subject areas

  • Control and Systems Engineering
  • Mechanical Engineering
  • Electrical and Electronic Engineering

Fingerprint

Dive into the research topics of 'In situ monitoring and universal modelling of sacrificial PSG etching using hydrofluoric acid'. Together they form a unique fingerprint.

Cite this