Infrared reflection-absorption spectroscope using thin film structures

S. J. Finke, Glenn L Schrader

Research output: Contribution to journalArticle

19 Citations (Scopus)

Abstract

Infrared reflection-absorption spectroscopy (IRRAS) has been used extensively in the study of adsorbates and thin layers on metal surfaces, but little work has been performed on non-metals due to the low sensitivity which results when these materials are used. In this work, thin film structures consisting of a thin layer of a semiconductor (silicon) on a metal (copper) surface are used to increase the sensitivity of the technique for examining layers of poly(methylmethacrylate).

Original languageEnglish (US)
Pages (from-to)91-96
Number of pages6
JournalSpectrochimica Acta Part A: Molecular Spectroscopy
Volume46
Issue number1
DOIs
StatePublished - 1990
Externally publishedYes

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Infrared radiation
Thin films
Adsorbates
Metals
Absorption spectroscopy
Semiconductor materials
Copper
Silicon

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Infrared reflection-absorption spectroscope using thin film structures. / Finke, S. J.; Schrader, Glenn L.

In: Spectrochimica Acta Part A: Molecular Spectroscopy, Vol. 46, No. 1, 1990, p. 91-96.

Research output: Contribution to journalArticle

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