Interaction of a polyglycidol-based nonionic surfactant with silicon in hydrofluoric acid solutions

Philip D. Haworth, Michael J. Kovach, Roger P. Sperline, Srini Raghavan

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

The interaction of an alkyl polyglycidol surfactant with hydrogen-passivated silicon from dilute hydrofluoric acid solutions has been measured using wettability and attenuated total reflection Fourier transform infrared spectroscopic techniques. The surfactant was found to be very effective in rendering hydrophobic hydrogen-terminated silicon hydrophilic in the hydrofluoric acid solutions. The adsorption of the surfactant, and its desorption when rinsed with deionized water, were very rapid. However, approximately 20% of the adsorbed surfactant remained on the silicon surface even after prolonged rinsing.

Original languageEnglish (US)
Pages (from-to)2284-2288
Number of pages5
JournalJournal of the Electrochemical Society
Volume146
Issue number6
DOIs
StatePublished - Jun 1999

Fingerprint

Hydrofluoric Acid
Hydrofluoric acid
Nonionic surfactants
hydrofluoric acid
Silicon
Surface-Active Agents
Surface active agents
surfactants
silicon
Hydrogen
interactions
Deionized water
hydrogen
wettability
Wetting
Desorption
Fourier transforms
desorption
Infrared radiation
Adsorption

ASJC Scopus subject areas

  • Electrochemistry
  • Surfaces, Coatings and Films
  • Surfaces and Interfaces

Cite this

Interaction of a polyglycidol-based nonionic surfactant with silicon in hydrofluoric acid solutions. / Haworth, Philip D.; Kovach, Michael J.; Sperline, Roger P.; Raghavan, Srini.

In: Journal of the Electrochemical Society, Vol. 146, No. 6, 06.1999, p. 2284-2288.

Research output: Contribution to journalArticle

Haworth, Philip D. ; Kovach, Michael J. ; Sperline, Roger P. ; Raghavan, Srini. / Interaction of a polyglycidol-based nonionic surfactant with silicon in hydrofluoric acid solutions. In: Journal of the Electrochemical Society. 1999 ; Vol. 146, No. 6. pp. 2284-2288.
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