Interaction of a polyglycidol-based nonionic surfactant with silicon in hydrofluoric acid solutions

Philip D. Haworth, Michael J. Kovach, Roger P. Sperline, Srini Raghavan

Research output: Contribution to journalArticle

5 Scopus citations

Abstract

The interaction of an alkyl polyglycidol surfactant with hydrogen-passivated silicon from dilute hydrofluoric acid solutions has been measured using wettability and attenuated total reflection Fourier transform infrared spectroscopic techniques. The surfactant was found to be very effective in rendering hydrophobic hydrogen-terminated silicon hydrophilic in the hydrofluoric acid solutions. The adsorption of the surfactant, and its desorption when rinsed with deionized water, were very rapid. However, approximately 20% of the adsorbed surfactant remained on the silicon surface even after prolonged rinsing.

Original languageEnglish (US)
Pages (from-to)2284-2288
Number of pages5
JournalJournal of the Electrochemical Society
Volume146
Issue number6
DOIs
StatePublished - Jun 1 1999

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ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Renewable Energy, Sustainability and the Environment
  • Surfaces, Coatings and Films
  • Electrochemistry
  • Materials Chemistry

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