Interdiffusion and thermal stability in magnetic tunnel junction ferromagnet/insulator/ferromagnet trilayer structures

Sungkyun Park, David J. Keavney, Charles M Falco

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

The air-oxidized magnetic tunnel junction structures grown by molecular beam epitaxy (MBE) were studied. The thermal stability of the trilayer structures was analyzed using x-ray photoelectron spectroscopy (XPS) and in situ scanning tunneling microscopy (STM). No oxidation of the bottom magnetic layer was shown in the unannealed trilayers for barriers thicker than 1.1 nm. The results upon annealing show that the metallic XPS peak of the top layers decrease dramatically, while that of the bottom and barrier layers increases.

Original languageEnglish (US)
Pages (from-to)3037-3040
Number of pages4
JournalJournal of Applied Physics
Volume95
Issue number6
DOIs
StatePublished - Mar 15 2004

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tunnel junctions
thermal stability
insulators
x ray spectroscopy
photoelectron spectroscopy
barrier layers
scanning tunneling microscopy
molecular beam epitaxy
oxidation
annealing
air

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)
  • Physics and Astronomy(all)

Cite this

Interdiffusion and thermal stability in magnetic tunnel junction ferromagnet/insulator/ferromagnet trilayer structures. / Park, Sungkyun; Keavney, David J.; Falco, Charles M.

In: Journal of Applied Physics, Vol. 95, No. 6, 15.03.2004, p. 3037-3040.

Research output: Contribution to journalArticle

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