Interfaces in Mo/Si multilayers

J. M. Slaughter, Patrick A. Kearney, Dean W. Schulze, Charles M Falco, R. N. Watts, C. R. Hills, E. B. Saloman

Research output: Chapter in Book/Report/Conference proceedingConference contribution

34 Citations (Scopus)

Abstract

Mo/Si multilayer mirrors with high peak reflectivities have been fabricated in many laboratories. This material pair works very well for wavelengths between 125 angstrom and 250 angstrom, and is therefore very useful in optics for astronomy and microscopy. However, complete understanding of the properties of these structures is presently limited by lack of understanding of the details of the interfaces. We report results from a study of Mo/Si interfaces performed with state-of-the-art surface science instruments and electron microscopy. Mo films and Mo/Si multilayers were deposited in ultra-high vacuum on clean Si surfaces using feedback-controlled electron-beam evaporators in a Molecular Beam Epitaxy growth chamber. These films were characterized with in situ RHEED, LEED, Auger, and XPS. Surprisingly, peak shifts in the XPS spectra indicate silicide formation at the interface for growth temperatures as low as 50 C (the lowest temperature studied). RHEED and LEED indicate that the silicide layer formed at low temperatures is amorphous. A contraction in the period of Mo/Si multilayers is observed as the deposition temperature is raised from 50 C to 200 C. This contraction can be accounted for by the formation of an interfacial silicide. TEM micrographs show an interfacial layer at the Mo on Si interfaces but not at the Si on Mo interfaces. Low-angle x-ray diffraction and synchrotron radiation characterization results for multilayers prepared under a variety of conditions are reported.

Original languageEnglish (US)
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
EditorsRichard B. Hoover, Arthur B.C.Jr. Walker
PublisherPubl by Int Soc for Optical Engineering
Pages73-82
Number of pages10
Volume1343
StatePublished - 1991
EventX-Ray/EUV Optics for Astronomy, Microscopy, Polarimetry, and Projection Lithography - San Diego, CA, USA
Duration: Jul 9 1990Jul 13 1990

Other

OtherX-Ray/EUV Optics for Astronomy, Microscopy, Polarimetry, and Projection Lithography
CitySan Diego, CA, USA
Period7/9/907/13/90

Fingerprint

Multilayers
Reflection high energy electron diffraction
X ray photoelectron spectroscopy
contraction
Astronomy
diffraction radiation
microscopy
Ultrahigh vacuum
Growth temperature
phytotrons
Evaporators
Synchrotron radiation
Molecular beam epitaxy
evaporators
Temperature
Electron microscopy
Electron beams
Optics
Microscopic examination
astronomy

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Condensed Matter Physics

Cite this

Slaughter, J. M., Kearney, P. A., Schulze, D. W., Falco, C. M., Watts, R. N., Hills, C. R., & Saloman, E. B. (1991). Interfaces in Mo/Si multilayers. In R. B. Hoover, & A. B. C. J. Walker (Eds.), Proceedings of SPIE - The International Society for Optical Engineering (Vol. 1343, pp. 73-82). Publ by Int Soc for Optical Engineering.

Interfaces in Mo/Si multilayers. / Slaughter, J. M.; Kearney, Patrick A.; Schulze, Dean W.; Falco, Charles M; Watts, R. N.; Hills, C. R.; Saloman, E. B.

Proceedings of SPIE - The International Society for Optical Engineering. ed. / Richard B. Hoover; Arthur B.C.Jr. Walker. Vol. 1343 Publ by Int Soc for Optical Engineering, 1991. p. 73-82.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Slaughter, JM, Kearney, PA, Schulze, DW, Falco, CM, Watts, RN, Hills, CR & Saloman, EB 1991, Interfaces in Mo/Si multilayers. in RB Hoover & ABCJ Walker (eds), Proceedings of SPIE - The International Society for Optical Engineering. vol. 1343, Publ by Int Soc for Optical Engineering, pp. 73-82, X-Ray/EUV Optics for Astronomy, Microscopy, Polarimetry, and Projection Lithography, San Diego, CA, USA, 7/9/90.
Slaughter JM, Kearney PA, Schulze DW, Falco CM, Watts RN, Hills CR et al. Interfaces in Mo/Si multilayers. In Hoover RB, Walker ABCJ, editors, Proceedings of SPIE - The International Society for Optical Engineering. Vol. 1343. Publ by Int Soc for Optical Engineering. 1991. p. 73-82
Slaughter, J. M. ; Kearney, Patrick A. ; Schulze, Dean W. ; Falco, Charles M ; Watts, R. N. ; Hills, C. R. ; Saloman, E. B. / Interfaces in Mo/Si multilayers. Proceedings of SPIE - The International Society for Optical Engineering. editor / Richard B. Hoover ; Arthur B.C.Jr. Walker. Vol. 1343 Publ by Int Soc for Optical Engineering, 1991. pp. 73-82
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