Introduction to Micro-Systems and to the Techniques for Their Fabrication

Research output: Chapter in Book/Report/Conference proceedingChapter

Abstract

This chapter presents an introduction to the main manufacturing processes for micro-systems. After a brief historical overview of the field of microsystems, their main manufacturing techniques are reviewed. These include substrate preparation, photolithography, oxidation and diffusion, thin-film deposition, and wet and dry etching techniques. MEMS-specific processes including bulk- and surface-micromachining, LIGA, soft-lithography, and anodic bonding are also presented. The material is illustrated with multiple examples of process parameter calculation. Examples of MEMS devices fabricated in the laboratory of the author are also provided.

Original languageEnglish (US)
Title of host publicationCISM International Centre for Mechanical Sciences, Courses and Lectures
PublisherSpringer International Publishing
Pages1-36
Number of pages36
DOIs
StatePublished - Jan 1 2006

Publication series

NameCISM International Centre for Mechanical Sciences, Courses and Lectures
Volume478
ISSN (Print)0254-1971
ISSN (Electronic)2309-3706

Keywords

  • Anisotropic Etching
  • Etch Rate
  • Junction Depth
  • Pattern Transfer
  • Thermal Actuator

ASJC Scopus subject areas

  • Mechanical Engineering
  • Mechanics of Materials
  • Computer Science Applications
  • Modeling and Simulation

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  • Cite this

    Enikov, E. T. (2006). Introduction to Micro-Systems and to the Techniques for Their Fabrication. In CISM International Centre for Mechanical Sciences, Courses and Lectures (pp. 1-36). (CISM International Centre for Mechanical Sciences, Courses and Lectures; Vol. 478). Springer International Publishing. https://doi.org/10.1007/978-3-211-48549-1_1