Investigation of sources of metallic contamination by TXRF

S. Verhaverbeke, C. Werkhoven, M. Meuris, H. F. Schmidt, K. Dillenbeck, P. Mertens, M. Heyns, A. Philipossian

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Scopus citations

Abstract

In this work we show a number of different applications for the use of TXRF to investigate metallic impurity sources. At first, we show that TXRF is well suited to measure metallic impurities in liquids which can be dried on a Si wafer. Then we show the measurement of the leaching of metallic impurities from polymers. Finally, by using a scrubber, the metallic impurities in gases can be measured and the performance of filters can be investigated.

Original languageEnglish (US)
Title of host publicationProceedings, Annual Technical Meeting - Institute of Environmental Sciences
Editors Anon
PublisherPubl by Inst of Environmental Sciences
Pages423-431
Number of pages9
ISBN (Print)1877862193
StatePublished - Dec 1 1993
Externally publishedYes
EventProceedings of the 39th Annual Technical Meeting of Institute of Environmental Sciences - Las Vegas, NV, USA
Duration: May 2 1993May 7 1993

Publication series

NameProceedings, Annual Technical Meeting - Institute of Environmental Sciences
Volume1
ISSN (Print)0073-9227

Other

OtherProceedings of the 39th Annual Technical Meeting of Institute of Environmental Sciences
CityLas Vegas, NV, USA
Period5/2/935/7/93

ASJC Scopus subject areas

  • Environmental Engineering

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  • Cite this

    Verhaverbeke, S., Werkhoven, C., Meuris, M., Schmidt, H. F., Dillenbeck, K., Mertens, P., Heyns, M., & Philipossian, A. (1993). Investigation of sources of metallic contamination by TXRF. In Anon (Ed.), Proceedings, Annual Technical Meeting - Institute of Environmental Sciences (pp. 423-431). (Proceedings, Annual Technical Meeting - Institute of Environmental Sciences; Vol. 1). Publ by Inst of Environmental Sciences.