ION BEAM LITHOGRAPHY SYSTEM USING A HIGH BRIGHTNESS H//2 ** plus ION SOURCE.

Benjamin M. Siegel, Gary R. Hanson, Miklos N Szilagyi, David R. Thomas, Richard J. Blackwell, Hongyul Paik

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)
Original languageEnglish (US)
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
PublisherSPIE
Pages152-157
Number of pages6
Volume333
ISBN (Print)0892523689
StatePublished - 1982
Externally publishedYes

Fingerprint

Ion beam lithography
Ion sources
computer aided design
luminance
ion sources
Lithography
Luminance
Computer aided design
brightness
lithography
ion beams
ion probes
probes
Ions
Current density
current density
deflectors
Ion beams
high current
ions

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Condensed Matter Physics

Cite this

Siegel, B. M., Hanson, G. R., Szilagyi, M. N., Thomas, D. R., Blackwell, R. J., & Paik, H. (1982). ION BEAM LITHOGRAPHY SYSTEM USING A HIGH BRIGHTNESS H//2 ** plus ION SOURCE. In Proceedings of SPIE - The International Society for Optical Engineering (Vol. 333, pp. 152-157). SPIE.

ION BEAM LITHOGRAPHY SYSTEM USING A HIGH BRIGHTNESS H//2 ** plus ION SOURCE. / Siegel, Benjamin M.; Hanson, Gary R.; Szilagyi, Miklos N; Thomas, David R.; Blackwell, Richard J.; Paik, Hongyul.

Proceedings of SPIE - The International Society for Optical Engineering. Vol. 333 SPIE, 1982. p. 152-157.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Siegel, BM, Hanson, GR, Szilagyi, MN, Thomas, DR, Blackwell, RJ & Paik, H 1982, ION BEAM LITHOGRAPHY SYSTEM USING A HIGH BRIGHTNESS H//2 ** plus ION SOURCE. in Proceedings of SPIE - The International Society for Optical Engineering. vol. 333, SPIE, pp. 152-157.
Siegel BM, Hanson GR, Szilagyi MN, Thomas DR, Blackwell RJ, Paik H. ION BEAM LITHOGRAPHY SYSTEM USING A HIGH BRIGHTNESS H//2 ** plus ION SOURCE. In Proceedings of SPIE - The International Society for Optical Engineering. Vol. 333. SPIE. 1982. p. 152-157
Siegel, Benjamin M. ; Hanson, Gary R. ; Szilagyi, Miklos N ; Thomas, David R. ; Blackwell, Richard J. ; Paik, Hongyul. / ION BEAM LITHOGRAPHY SYSTEM USING A HIGH BRIGHTNESS H//2 ** plus ION SOURCE. Proceedings of SPIE - The International Society for Optical Engineering. Vol. 333 SPIE, 1982. pp. 152-157
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