Laser-induced phase transitions of Ge2Sb2Te 5 thin films used in optical and electronic data storage and in thermal lithography

Cheng Hung Chu, Chiun Da Shiue, Hsuen Wei Cheng, Ming Lun Tseng, Hai Pang Chiang, Masud Mansuripur, Din Ping Tsai

Research output: Contribution to journalArticle

62 Citations (Scopus)

Abstract

Amorphous thin films of Ge2Sb2Te5, sputter-deposited on a ZnS-SiO2 dielectric layer, are investigated for the purpose of understanding the structural phase-transitions that occur under the influence of tightly-focused laser beams. Selective chemical etching of recorded marks in conjunction with optical, atomic force, and electron microscopy as well as local electron diffraction analysis are used to discern the complex structural features created under a broad range of laser powers and pulse durations. Clarifying the nature of phase transitions associated with laser-recorded marks in chalcogenide Ge2Sb2Te5 thin films provides useful information for reversible optical and electronic data storage, as well as for phase-change (thermal) lithography.

Original languageEnglish (US)
Pages (from-to)18383-18393
Number of pages11
JournalOptics Express
Volume18
Issue number17
DOIs
StatePublished - Aug 16 2010

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data storage
lithography
thin films
electronics
lasers
electron microscopy
pulse duration
electron diffraction
etching
atomic force microscopy
laser beams

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

Cite this

Laser-induced phase transitions of Ge2Sb2Te 5 thin films used in optical and electronic data storage and in thermal lithography. / Chu, Cheng Hung; Da Shiue, Chiun; Cheng, Hsuen Wei; Tseng, Ming Lun; Chiang, Hai Pang; Mansuripur, Masud; Tsai, Din Ping.

In: Optics Express, Vol. 18, No. 17, 16.08.2010, p. 18383-18393.

Research output: Contribution to journalArticle

Chu, Cheng Hung ; Da Shiue, Chiun ; Cheng, Hsuen Wei ; Tseng, Ming Lun ; Chiang, Hai Pang ; Mansuripur, Masud ; Tsai, Din Ping. / Laser-induced phase transitions of Ge2Sb2Te 5 thin films used in optical and electronic data storage and in thermal lithography. In: Optics Express. 2010 ; Vol. 18, No. 17. pp. 18383-18393.
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